Atmospheric-pressure atomic layer deposition: recent applications and new emerging applications in high-porosity/3D materials

Atomic layer deposition (ALD) is a widely recognized technique for depositing ultrathin conformal films with excellent thickness control at Ångström or (sub)monolayer level. Atmospheric-pressure ALD is an upcoming ALD process with a potentially lower ownership cost of the reactor. In this review, we...

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Detalles Bibliográficos
Autores principales: Chen, M., Nijboer, M. P., Kovalgin, A. Y., Nijmeijer, A., Roozeboom, F., Luiten-Olieman, M. W. J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2023
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10392469/
https://www.ncbi.nlm.nih.gov/pubmed/37376785
http://dx.doi.org/10.1039/d3dt01204b

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10392469/
https://www.ncbi.nlm.nih.gov/pubmed/37376785
http://dx.doi.org/10.1039/d3dt01204b

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