Surface Morphology and Optical Properties of Hafnium Oxide Thin Films Produced by Magnetron Sputtering

Hafnium oxide films were deposited on sapphire and silicon (100) substrates using the DC reactive magnetron sputtering technique from a pure hafnium target at different discharge power levels. The influence of the cathode power on the chemical composition, morphology, crystallographic structure and...

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Detalles Bibliográficos
Autores principales: Araiza, José de Jesús, Álvarez-Fraga, Leo, Gago, Raúl, Sánchez, Olga
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10419556/
https://www.ncbi.nlm.nih.gov/pubmed/37570035
http://dx.doi.org/10.3390/ma16155331

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10419556/
https://www.ncbi.nlm.nih.gov/pubmed/37570035
http://dx.doi.org/10.3390/ma16155331

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