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Effect of Carbon Layer Thickness on the Electrocatalytic Oxidation of Glucose in a Ni/BDD Composite Electrode

High-performance non-enzymatic glucose sensor composite electrodes were prepared by loading Ni onto a boron-doped diamond (BDD) film surface through a thermal catalytic etching method. A carbon precipitate with a desired thickness could be formed on the Ni/BDD composite electrode surface by tuning t...

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Detalles Bibliográficos
Autores principales: Long, Hangyu, Wen, Kui, Liu, Cuiyin, Liu, Xuezhang, Hu, Huawen
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10421277/
https://www.ncbi.nlm.nih.gov/pubmed/37570767
http://dx.doi.org/10.3390/molecules28155798
Descripción
Sumario:High-performance non-enzymatic glucose sensor composite electrodes were prepared by loading Ni onto a boron-doped diamond (BDD) film surface through a thermal catalytic etching method. A carbon precipitate with a desired thickness could be formed on the Ni/BDD composite electrode surface by tuning the processing conditions. A systematic study regarding the influence of the precipitated carbon layer thickness on the electrocatalytic oxidation of glucose was conducted. While an oxygen plasma was used to etch the precipitated carbon, Ni/BDD-based composite electrodes with the precipitated carbon layers of different thicknesses could be obtained by controlling the oxygen plasma power. These Ni/BDD electrodes were characterized by SEM microscopies, Raman and XPS spectroscopies, and electrochemical tests. The results showed that the carbon layer thickness exerted a significant impact on the resulting electrocatalytic performance. The electrode etched under 200 W power exhibited the best performance, followed by the untreated electrode and the electrode etched under 400 W power with the worst performance. Specifically, the electrode etched under 200 W was demonstrated to possess the highest sensitivity of 1443.75 μA cm(−2) mM(−1) and the lowest detection limit of 0.5 μM.