_version_ 1785095293450059776
author Toriki, Ethan S.
Papatzimas, James W.
Nishikawa, Kaila
Dovala, Dustin
Frank, Andreas O.
Hesse, Matthew J.
Dankova, Daniela
Song, Jae-Geun
Bruce-Smythe, Megan
Struble, Heidi
Garcia, Francisco J.
Brittain, Scott M.
Kile, Andrew C.
McGregor, Lynn M.
McKenna, Jeffrey M.
Tallarico, John A.
Schirle, Markus
Nomura, Daniel K.
author_facet Toriki, Ethan S.
Papatzimas, James W.
Nishikawa, Kaila
Dovala, Dustin
Frank, Andreas O.
Hesse, Matthew J.
Dankova, Daniela
Song, Jae-Geun
Bruce-Smythe, Megan
Struble, Heidi
Garcia, Francisco J.
Brittain, Scott M.
Kile, Andrew C.
McGregor, Lynn M.
McKenna, Jeffrey M.
Tallarico, John A.
Schirle, Markus
Nomura, Daniel K.
author_sort Toriki, Ethan S.
collection PubMed
description
format Online
Article
Text
id pubmed-10450871
institution National Center for Biotechnology Information
language English
publishDate 2023
publisher American Chemical Society
record_format MEDLINE/PubMed
spelling pubmed-104508712023-08-26 Correction to “Rational Chemical Design of Molecular Glue Degraders” Toriki, Ethan S. Papatzimas, James W. Nishikawa, Kaila Dovala, Dustin Frank, Andreas O. Hesse, Matthew J. Dankova, Daniela Song, Jae-Geun Bruce-Smythe, Megan Struble, Heidi Garcia, Francisco J. Brittain, Scott M. Kile, Andrew C. McGregor, Lynn M. McKenna, Jeffrey M. Tallarico, John A. Schirle, Markus Nomura, Daniel K. ACS Cent Sci American Chemical Society 2023-07-21 /pmc/articles/PMC10450871/ /pubmed/37637749 http://dx.doi.org/10.1021/acscentsci.3c00844 Text en © 2023 The Authors. Published by American Chemical Society https://creativecommons.org/licenses/by/4.0/Permits the broadest form of re-use including for commercial purposes, provided that author attribution and integrity are maintained (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Toriki, Ethan S.
Papatzimas, James W.
Nishikawa, Kaila
Dovala, Dustin
Frank, Andreas O.
Hesse, Matthew J.
Dankova, Daniela
Song, Jae-Geun
Bruce-Smythe, Megan
Struble, Heidi
Garcia, Francisco J.
Brittain, Scott M.
Kile, Andrew C.
McGregor, Lynn M.
McKenna, Jeffrey M.
Tallarico, John A.
Schirle, Markus
Nomura, Daniel K.
Correction to “Rational Chemical Design of Molecular Glue Degraders”
title Correction to “Rational Chemical Design of Molecular Glue Degraders”
title_full Correction to “Rational Chemical Design of Molecular Glue Degraders”
title_fullStr Correction to “Rational Chemical Design of Molecular Glue Degraders”
title_full_unstemmed Correction to “Rational Chemical Design of Molecular Glue Degraders”
title_short Correction to “Rational Chemical Design of Molecular Glue Degraders”
title_sort correction to “rational chemical design of molecular glue degraders”
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10450871/
https://www.ncbi.nlm.nih.gov/pubmed/37637749
http://dx.doi.org/10.1021/acscentsci.3c00844
work_keys_str_mv AT torikiethans correctiontorationalchemicaldesignofmoleculargluedegraders
AT papatzimasjamesw correctiontorationalchemicaldesignofmoleculargluedegraders
AT nishikawakaila correctiontorationalchemicaldesignofmoleculargluedegraders
AT dovaladustin correctiontorationalchemicaldesignofmoleculargluedegraders
AT frankandreaso correctiontorationalchemicaldesignofmoleculargluedegraders
AT hessematthewj correctiontorationalchemicaldesignofmoleculargluedegraders
AT dankovadaniela correctiontorationalchemicaldesignofmoleculargluedegraders
AT songjaegeun correctiontorationalchemicaldesignofmoleculargluedegraders
AT brucesmythemegan correctiontorationalchemicaldesignofmoleculargluedegraders
AT strubleheidi correctiontorationalchemicaldesignofmoleculargluedegraders
AT garciafranciscoj correctiontorationalchemicaldesignofmoleculargluedegraders
AT brittainscottm correctiontorationalchemicaldesignofmoleculargluedegraders
AT kileandrewc correctiontorationalchemicaldesignofmoleculargluedegraders
AT mcgregorlynnm correctiontorationalchemicaldesignofmoleculargluedegraders
AT mckennajeffreym correctiontorationalchemicaldesignofmoleculargluedegraders
AT tallaricojohna correctiontorationalchemicaldesignofmoleculargluedegraders
AT schirlemarkus correctiontorationalchemicaldesignofmoleculargluedegraders
AT nomuradanielk correctiontorationalchemicaldesignofmoleculargluedegraders