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Characterization of SiO(2) Plasma Etching with Perfluorocarbon (C(4)F(8) and C(6)F(6)) and Hydrofluorocarbon (CHF(3) and C(4)H(2)F(6)) Precursors for the Greenhouse Gas Emissions Reduction

This paper proposes the use of environmentally friendly alternatives, C(6)F(6) and C(4)H(2)F(6), as perfluorocarbon (PFC) and hydrofluorocarbon (HFC) precursors, respectively, for SiO(2) plasma etching, instead of conventional precursors C(4)F(8) and CHF(3). The study employs scanning electron micro...

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Detalles Bibliográficos
Autores principales:	Choi, Minsu, Lee, Youngseok, You, Yebin, Cho, Chulhee, Jeong, Wonnyoung, Seong, Inho, Choi, Byeongyeop, Kim, Sijun, Seol, Youbin, You, Shinjae, Yeom, Geun Young
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2023
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10456486/ https://www.ncbi.nlm.nih.gov/pubmed/37629915 http://dx.doi.org/10.3390/ma16165624

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