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Quality Assessment of Processed Graphene Chips for Biosensor Application
The quality of graphene intended for use in biosensors was assessed on manufactured chips using a set of methods including atomic force microscopy (AFM), Raman spectroscopy, and low-frequency noise investigation. It is shown that local areas of residues on the graphene surface, formed as a result of...
Autores principales: | , , , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10456491/ https://www.ncbi.nlm.nih.gov/pubmed/37629919 http://dx.doi.org/10.3390/ma16165628 |
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author | Shmidt, Natalia M. Shabunina, Evgeniya I. Gushchina, Ekaterina V. Petrov, Vasiliy N. Eliseyev, Ilya A. Lebedev, Sergey P. Priobrazhenskii, Sergei Iu. Tanklevskaya, Elena M. Puzyk, Mikhail V. Roenkov, Alexander D. Usikov, Alexander S. Lebedev, Alexander A. |
author_facet | Shmidt, Natalia M. Shabunina, Evgeniya I. Gushchina, Ekaterina V. Petrov, Vasiliy N. Eliseyev, Ilya A. Lebedev, Sergey P. Priobrazhenskii, Sergei Iu. Tanklevskaya, Elena M. Puzyk, Mikhail V. Roenkov, Alexander D. Usikov, Alexander S. Lebedev, Alexander A. |
author_sort | Shmidt, Natalia M. |
collection | PubMed |
description | The quality of graphene intended for use in biosensors was assessed on manufactured chips using a set of methods including atomic force microscopy (AFM), Raman spectroscopy, and low-frequency noise investigation. It is shown that local areas of residues on the graphene surface, formed as a result of the interaction of graphene with a photoresist at the initial stage of chip development, led to a spread of chip resistance (R) in the range of 1–10 kOhm and to an increase in the root mean square (RMS) roughness up to 10 times, which can significantly worsen the reproducibility of the parameters of graphene chips for biosensor applications. It was observed that the control of the photoresist residues after photolithography (PLG) using AFM and subsequent additional cleaning reduced the spread of R values in chips to 1–1.6 kOhm and obtained an RMS roughness similar to the roughness in the graphene film before PLG. Monitoring of the spectral density of low-frequency voltage fluctuation (S(U)), which provides integral information about the system of defects and quality of the material, makes it possible to identify chips with low graphene quality and with inhomogeneously distributed areas of compressive stresses by the type of frequency dependence S(U)(f). |
format | Online Article Text |
id | pubmed-10456491 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2023 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-104564912023-08-26 Quality Assessment of Processed Graphene Chips for Biosensor Application Shmidt, Natalia M. Shabunina, Evgeniya I. Gushchina, Ekaterina V. Petrov, Vasiliy N. Eliseyev, Ilya A. Lebedev, Sergey P. Priobrazhenskii, Sergei Iu. Tanklevskaya, Elena M. Puzyk, Mikhail V. Roenkov, Alexander D. Usikov, Alexander S. Lebedev, Alexander A. Materials (Basel) Article The quality of graphene intended for use in biosensors was assessed on manufactured chips using a set of methods including atomic force microscopy (AFM), Raman spectroscopy, and low-frequency noise investigation. It is shown that local areas of residues on the graphene surface, formed as a result of the interaction of graphene with a photoresist at the initial stage of chip development, led to a spread of chip resistance (R) in the range of 1–10 kOhm and to an increase in the root mean square (RMS) roughness up to 10 times, which can significantly worsen the reproducibility of the parameters of graphene chips for biosensor applications. It was observed that the control of the photoresist residues after photolithography (PLG) using AFM and subsequent additional cleaning reduced the spread of R values in chips to 1–1.6 kOhm and obtained an RMS roughness similar to the roughness in the graphene film before PLG. Monitoring of the spectral density of low-frequency voltage fluctuation (S(U)), which provides integral information about the system of defects and quality of the material, makes it possible to identify chips with low graphene quality and with inhomogeneously distributed areas of compressive stresses by the type of frequency dependence S(U)(f). MDPI 2023-08-15 /pmc/articles/PMC10456491/ /pubmed/37629919 http://dx.doi.org/10.3390/ma16165628 Text en © 2023 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Shmidt, Natalia M. Shabunina, Evgeniya I. Gushchina, Ekaterina V. Petrov, Vasiliy N. Eliseyev, Ilya A. Lebedev, Sergey P. Priobrazhenskii, Sergei Iu. Tanklevskaya, Elena M. Puzyk, Mikhail V. Roenkov, Alexander D. Usikov, Alexander S. Lebedev, Alexander A. Quality Assessment of Processed Graphene Chips for Biosensor Application |
title | Quality Assessment of Processed Graphene Chips for Biosensor Application |
title_full | Quality Assessment of Processed Graphene Chips for Biosensor Application |
title_fullStr | Quality Assessment of Processed Graphene Chips for Biosensor Application |
title_full_unstemmed | Quality Assessment of Processed Graphene Chips for Biosensor Application |
title_short | Quality Assessment of Processed Graphene Chips for Biosensor Application |
title_sort | quality assessment of processed graphene chips for biosensor application |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10456491/ https://www.ncbi.nlm.nih.gov/pubmed/37629919 http://dx.doi.org/10.3390/ma16165628 |
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