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Novel Mechanism-Based Descriptors for Extreme Ultraviolet-Induced Photoacid Generation: Key Factors Affecting Extreme Ultraviolet Sensitivity

Predicting photolithography performance in silico for a given materials combination is essential for developing better patterning processes. However, it is still an extremely daunting task because of the entangled chemistry with multiple reactions among many material components. Herein, we investiga...

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Detalles Bibliográficos
Autores principales:	Park, Ji Young, Song, Hyun-Ji, Nguyen, Thanh Cuong, Son, Won-Joon, Kim, Daekeon, Song, Giyoung, Hong, Suk-Koo, Go, Heeyoung, Park, Changmin, Jang, Inkook, Kim, Dae Sin
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2023
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10488646/ https://www.ncbi.nlm.nih.gov/pubmed/37687074 http://dx.doi.org/10.3390/molecules28176244

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