Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma

The understanding of ion dynamics in plasma applications has received significant attention. In this study, we examined these effects between He and Ar species, focusing on the Ar ion flux on the substrate. To control heterogeneous collisions, we varied the He addition rate at fixed chamber pressure...

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Detalles Bibliográficos
Autores principales: Seong, Inho, Kim, Sijun, Choi, Minsu, Lee, Woobeen, Jeong, Wonnyoung, Cho, Chulhee, You, Yebin, Lee, Youngseok, Seol, Youbin, You, Shinjae
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10488939/
https://www.ncbi.nlm.nih.gov/pubmed/37687439
http://dx.doi.org/10.3390/ma16175746

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10488939/
https://www.ncbi.nlm.nih.gov/pubmed/37687439
http://dx.doi.org/10.3390/ma16175746

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