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Highly-excited Rydberg excitons in synthetic thin-film cuprous oxide

Cuprous oxide ([Formula: see text] ) has recently emerged as a promising material in solid-state quantum technology, specifically for its excitonic Rydberg states characterized by large principal quantum numbers (n). The significant wavefunction size of these highly-excited states (proportional to [...

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Autores principales: DeLange, Jacob, Barua, Kinjol, Paul, Anindya Sundar, Ohadi, Hamid, Zwiller, Val, Steinhauer, Stephan, Alaeian, Hadiseh
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10558487/
https://www.ncbi.nlm.nih.gov/pubmed/37803008
http://dx.doi.org/10.1038/s41598-023-41465-y
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author DeLange, Jacob
Barua, Kinjol
Paul, Anindya Sundar
Ohadi, Hamid
Zwiller, Val
Steinhauer, Stephan
Alaeian, Hadiseh
author_facet DeLange, Jacob
Barua, Kinjol
Paul, Anindya Sundar
Ohadi, Hamid
Zwiller, Val
Steinhauer, Stephan
Alaeian, Hadiseh
author_sort DeLange, Jacob
collection PubMed
description Cuprous oxide ([Formula: see text] ) has recently emerged as a promising material in solid-state quantum technology, specifically for its excitonic Rydberg states characterized by large principal quantum numbers (n). The significant wavefunction size of these highly-excited states (proportional to [Formula: see text] ) enables strong long-range dipole-dipole (proportional to [Formula: see text] ) and van der Waals interactions (proportional to [Formula: see text] ). Currently, the highest-lying Rydberg states are found in naturally occurring [Formula: see text] . However, for technological applications, the ability to grow high-quality synthetic samples is essential. The fabrication of thin-film [Formula: see text] samples is of particular interest as they hold potential for observing extreme single-photon nonlinearities through the Rydberg blockade. Nevertheless, due to the susceptibility of high-lying states to charged impurities, growing synthetic samples of sufficient quality poses a substantial challenge. This study successfully demonstrates the CMOS-compatible synthesis of a [Formula: see text] thin film on a transparent substrate that showcases Rydberg excitons up to [Formula: see text] which is readily suitable for photonic device fabrications. These findings mark a significant advancement towards the realization of scalable and on-chip integrable Rydberg quantum technologies.
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spelling pubmed-105584872023-10-08 Highly-excited Rydberg excitons in synthetic thin-film cuprous oxide DeLange, Jacob Barua, Kinjol Paul, Anindya Sundar Ohadi, Hamid Zwiller, Val Steinhauer, Stephan Alaeian, Hadiseh Sci Rep Article Cuprous oxide ([Formula: see text] ) has recently emerged as a promising material in solid-state quantum technology, specifically for its excitonic Rydberg states characterized by large principal quantum numbers (n). The significant wavefunction size of these highly-excited states (proportional to [Formula: see text] ) enables strong long-range dipole-dipole (proportional to [Formula: see text] ) and van der Waals interactions (proportional to [Formula: see text] ). Currently, the highest-lying Rydberg states are found in naturally occurring [Formula: see text] . However, for technological applications, the ability to grow high-quality synthetic samples is essential. The fabrication of thin-film [Formula: see text] samples is of particular interest as they hold potential for observing extreme single-photon nonlinearities through the Rydberg blockade. Nevertheless, due to the susceptibility of high-lying states to charged impurities, growing synthetic samples of sufficient quality poses a substantial challenge. This study successfully demonstrates the CMOS-compatible synthesis of a [Formula: see text] thin film on a transparent substrate that showcases Rydberg excitons up to [Formula: see text] which is readily suitable for photonic device fabrications. These findings mark a significant advancement towards the realization of scalable and on-chip integrable Rydberg quantum technologies. Nature Publishing Group UK 2023-10-06 /pmc/articles/PMC10558487/ /pubmed/37803008 http://dx.doi.org/10.1038/s41598-023-41465-y Text en © This is a U.S. Government work and not under copyright protection in the US; foreign copyright protection may apply 2023 https://creativecommons.org/licenses/by/4.0/Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) .
spellingShingle Article
DeLange, Jacob
Barua, Kinjol
Paul, Anindya Sundar
Ohadi, Hamid
Zwiller, Val
Steinhauer, Stephan
Alaeian, Hadiseh
Highly-excited Rydberg excitons in synthetic thin-film cuprous oxide
title Highly-excited Rydberg excitons in synthetic thin-film cuprous oxide
title_full Highly-excited Rydberg excitons in synthetic thin-film cuprous oxide
title_fullStr Highly-excited Rydberg excitons in synthetic thin-film cuprous oxide
title_full_unstemmed Highly-excited Rydberg excitons in synthetic thin-film cuprous oxide
title_short Highly-excited Rydberg excitons in synthetic thin-film cuprous oxide
title_sort highly-excited rydberg excitons in synthetic thin-film cuprous oxide
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10558487/
https://www.ncbi.nlm.nih.gov/pubmed/37803008
http://dx.doi.org/10.1038/s41598-023-41465-y
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