Enhanced Removal of Photoresist Films through Swelling and Dewetting Using Pluronic Surfactants

[Image: see text] Organic photoresist coatings, primarily composed of resins, are commonly used in the electronics industry to protect inorganic underlayers. Conventional photoresist strippers, such as amine-type agents, have shown high removal performance but led to environmental impact and substra...

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Detalles Bibliográficos
Autores principales: Hanzawa, Masaki, Ogura, Taku, Akamatsu, Masaaki, Sakai, Kenichi, Sakai, Hideki
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2023
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10586462/
https://www.ncbi.nlm.nih.gov/pubmed/37797199
http://dx.doi.org/10.1021/acs.langmuir.3c02034

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10586462/
https://www.ncbi.nlm.nih.gov/pubmed/37797199
http://dx.doi.org/10.1021/acs.langmuir.3c02034

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