Cargando…
Enhanced Removal of Photoresist Films through Swelling and Dewetting Using Pluronic Surfactants
[Image: see text] Organic photoresist coatings, primarily composed of resins, are commonly used in the electronics industry to protect inorganic underlayers. Conventional photoresist strippers, such as amine-type agents, have shown high removal performance but led to environmental impact and substra...
| Autores principales: | , , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical Society
2023
|
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10586462/ https://www.ncbi.nlm.nih.gov/pubmed/37797199 http://dx.doi.org/10.1021/acs.langmuir.3c02034 |