High Oxygen Sensitivity of TiO(2) Thin Films Deposited by ALD

The gas sensitivity and structural properties of TiO(2) thin films deposited by plasma-enhanced atomic layer deposition (ALD) were examined in detail. The TiO(2) thin films are deposited using Tetrakis(dimethylamido)titanium(IV) and oxygen plasma at 300 °C on SiO(2) substrates followed by annealing...

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Detalles Bibliográficos
Autores principales: Almaev, Aleksei V., Yakovlev, Nikita N., Almaev, Dmitry A., Verkholetov, Maksim G., Rudakov, Grigory A., Litvinova, Kristina I.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10609136/
https://www.ncbi.nlm.nih.gov/pubmed/37893312
http://dx.doi.org/10.3390/mi14101875

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10609136/
https://www.ncbi.nlm.nih.gov/pubmed/37893312
http://dx.doi.org/10.3390/mi14101875

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