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Optical Properties in Mid-Infrared Range of Silicon Oxide Thin Films with Different Stoichiometries
SiO(x) thin films were prepared using magnetron sputtering with different O(2) flow rates on a silicon substrate. The samples were characterized using Fourier transform infrared spectroscopy in transmission and reflection, covering a spectral range of 5 to 25 μm. By employing a multilayer model, the...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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MDPI
2023
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10609603/ https://www.ncbi.nlm.nih.gov/pubmed/37887900 http://dx.doi.org/10.3390/nano13202749 |