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Suppression of the redox reaction between the IGZO surface and the reducing agent TMA using fluorine oxidizing agent treatment
We propose that the post-deposition oxidation of the IGZO surface is essential for improving the interface quality, with Al(2)O(3) prepared by atomic layer deposition (ALD) employing a common metal precursor trimethylaluminum (TMA). Here, the ALD-Al(2)O(3) process was conducted using H(2)O as an oxi...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2023
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10641534/ https://www.ncbi.nlm.nih.gov/pubmed/37964900 http://dx.doi.org/10.1039/d3ra06768h |