Cargando…
Design and Fabrication of High Performance InGaAs near Infrared Photodetector
InGaAs photodiodes have a wide range of important applications; for example, NIR imaging, fiber optical communication, and spectroscopy. In this paper, we studied InGaAs photodiodes with different doping concentration absorber layers. The simulated results suggested that, by reducing the absorber do...
Autores principales: | , , , , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10650572/ https://www.ncbi.nlm.nih.gov/pubmed/37947739 http://dx.doi.org/10.3390/nano13212895 |
_version_ | 1785135811020193792 |
---|---|
author | Liu, Hezhuang Wang, Jingyi Guo, Daqian Shen, Kai Chen, Baile Wu, Jiang |
author_facet | Liu, Hezhuang Wang, Jingyi Guo, Daqian Shen, Kai Chen, Baile Wu, Jiang |
author_sort | Liu, Hezhuang |
collection | PubMed |
description | InGaAs photodiodes have a wide range of important applications; for example, NIR imaging, fiber optical communication, and spectroscopy. In this paper, we studied InGaAs photodiodes with different doping concentration absorber layers. The simulated results suggested that, by reducing the absorber doping concentration from 1 × 10(16) to 1 × 10(15) cm(−3), the maximum quantum efficiency of the devices can rise by 1.2%, to 58%. The simulation also showed that, by increasing the doping concentration of the absorber layer within a certain range, the dark current of the device can be slightly reduced. A PIN structure was grown and fabricated, and CV measurements suggested a low doping concentration of about 1.2 × 10(15) cm(−3). Although the thermal activation energy of the dark current suggested a distinct component of shunt dark current at a high temperature range, a dark current of ~6 × 10(−4) A/cm(2) (−0.5 V) was measured at room temperature. The peak quantum efficiency of the InGaAs device was characterized as 54.7% without antireflection coating and 80.2% with antireflection coating. |
format | Online Article Text |
id | pubmed-10650572 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2023 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-106505722023-11-01 Design and Fabrication of High Performance InGaAs near Infrared Photodetector Liu, Hezhuang Wang, Jingyi Guo, Daqian Shen, Kai Chen, Baile Wu, Jiang Nanomaterials (Basel) Article InGaAs photodiodes have a wide range of important applications; for example, NIR imaging, fiber optical communication, and spectroscopy. In this paper, we studied InGaAs photodiodes with different doping concentration absorber layers. The simulated results suggested that, by reducing the absorber doping concentration from 1 × 10(16) to 1 × 10(15) cm(−3), the maximum quantum efficiency of the devices can rise by 1.2%, to 58%. The simulation also showed that, by increasing the doping concentration of the absorber layer within a certain range, the dark current of the device can be slightly reduced. A PIN structure was grown and fabricated, and CV measurements suggested a low doping concentration of about 1.2 × 10(15) cm(−3). Although the thermal activation energy of the dark current suggested a distinct component of shunt dark current at a high temperature range, a dark current of ~6 × 10(−4) A/cm(2) (−0.5 V) was measured at room temperature. The peak quantum efficiency of the InGaAs device was characterized as 54.7% without antireflection coating and 80.2% with antireflection coating. MDPI 2023-11-01 /pmc/articles/PMC10650572/ /pubmed/37947739 http://dx.doi.org/10.3390/nano13212895 Text en © 2023 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Liu, Hezhuang Wang, Jingyi Guo, Daqian Shen, Kai Chen, Baile Wu, Jiang Design and Fabrication of High Performance InGaAs near Infrared Photodetector |
title | Design and Fabrication of High Performance InGaAs near Infrared Photodetector |
title_full | Design and Fabrication of High Performance InGaAs near Infrared Photodetector |
title_fullStr | Design and Fabrication of High Performance InGaAs near Infrared Photodetector |
title_full_unstemmed | Design and Fabrication of High Performance InGaAs near Infrared Photodetector |
title_short | Design and Fabrication of High Performance InGaAs near Infrared Photodetector |
title_sort | design and fabrication of high performance ingaas near infrared photodetector |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10650572/ https://www.ncbi.nlm.nih.gov/pubmed/37947739 http://dx.doi.org/10.3390/nano13212895 |
work_keys_str_mv | AT liuhezhuang designandfabricationofhighperformanceingaasnearinfraredphotodetector AT wangjingyi designandfabricationofhighperformanceingaasnearinfraredphotodetector AT guodaqian designandfabricationofhighperformanceingaasnearinfraredphotodetector AT shenkai designandfabricationofhighperformanceingaasnearinfraredphotodetector AT chenbaile designandfabricationofhighperformanceingaasnearinfraredphotodetector AT wujiang designandfabricationofhighperformanceingaasnearinfraredphotodetector |