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Design and Fabrication of High Performance InGaAs near Infrared Photodetector

InGaAs photodiodes have a wide range of important applications; for example, NIR imaging, fiber optical communication, and spectroscopy. In this paper, we studied InGaAs photodiodes with different doping concentration absorber layers. The simulated results suggested that, by reducing the absorber do...

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Autores principales: Liu, Hezhuang, Wang, Jingyi, Guo, Daqian, Shen, Kai, Chen, Baile, Wu, Jiang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10650572/
https://www.ncbi.nlm.nih.gov/pubmed/37947739
http://dx.doi.org/10.3390/nano13212895
_version_ 1785135811020193792
author Liu, Hezhuang
Wang, Jingyi
Guo, Daqian
Shen, Kai
Chen, Baile
Wu, Jiang
author_facet Liu, Hezhuang
Wang, Jingyi
Guo, Daqian
Shen, Kai
Chen, Baile
Wu, Jiang
author_sort Liu, Hezhuang
collection PubMed
description InGaAs photodiodes have a wide range of important applications; for example, NIR imaging, fiber optical communication, and spectroscopy. In this paper, we studied InGaAs photodiodes with different doping concentration absorber layers. The simulated results suggested that, by reducing the absorber doping concentration from 1 × 10(16) to 1 × 10(15) cm(−3), the maximum quantum efficiency of the devices can rise by 1.2%, to 58%. The simulation also showed that, by increasing the doping concentration of the absorber layer within a certain range, the dark current of the device can be slightly reduced. A PIN structure was grown and fabricated, and CV measurements suggested a low doping concentration of about 1.2 × 10(15) cm(−3). Although the thermal activation energy of the dark current suggested a distinct component of shunt dark current at a high temperature range, a dark current of ~6 × 10(−4) A/cm(2) (−0.5 V) was measured at room temperature. The peak quantum efficiency of the InGaAs device was characterized as 54.7% without antireflection coating and 80.2% with antireflection coating.
format Online
Article
Text
id pubmed-10650572
institution National Center for Biotechnology Information
language English
publishDate 2023
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-106505722023-11-01 Design and Fabrication of High Performance InGaAs near Infrared Photodetector Liu, Hezhuang Wang, Jingyi Guo, Daqian Shen, Kai Chen, Baile Wu, Jiang Nanomaterials (Basel) Article InGaAs photodiodes have a wide range of important applications; for example, NIR imaging, fiber optical communication, and spectroscopy. In this paper, we studied InGaAs photodiodes with different doping concentration absorber layers. The simulated results suggested that, by reducing the absorber doping concentration from 1 × 10(16) to 1 × 10(15) cm(−3), the maximum quantum efficiency of the devices can rise by 1.2%, to 58%. The simulation also showed that, by increasing the doping concentration of the absorber layer within a certain range, the dark current of the device can be slightly reduced. A PIN structure was grown and fabricated, and CV measurements suggested a low doping concentration of about 1.2 × 10(15) cm(−3). Although the thermal activation energy of the dark current suggested a distinct component of shunt dark current at a high temperature range, a dark current of ~6 × 10(−4) A/cm(2) (−0.5 V) was measured at room temperature. The peak quantum efficiency of the InGaAs device was characterized as 54.7% without antireflection coating and 80.2% with antireflection coating. MDPI 2023-11-01 /pmc/articles/PMC10650572/ /pubmed/37947739 http://dx.doi.org/10.3390/nano13212895 Text en © 2023 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Liu, Hezhuang
Wang, Jingyi
Guo, Daqian
Shen, Kai
Chen, Baile
Wu, Jiang
Design and Fabrication of High Performance InGaAs near Infrared Photodetector
title Design and Fabrication of High Performance InGaAs near Infrared Photodetector
title_full Design and Fabrication of High Performance InGaAs near Infrared Photodetector
title_fullStr Design and Fabrication of High Performance InGaAs near Infrared Photodetector
title_full_unstemmed Design and Fabrication of High Performance InGaAs near Infrared Photodetector
title_short Design and Fabrication of High Performance InGaAs near Infrared Photodetector
title_sort design and fabrication of high performance ingaas near infrared photodetector
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10650572/
https://www.ncbi.nlm.nih.gov/pubmed/37947739
http://dx.doi.org/10.3390/nano13212895
work_keys_str_mv AT liuhezhuang designandfabricationofhighperformanceingaasnearinfraredphotodetector
AT wangjingyi designandfabricationofhighperformanceingaasnearinfraredphotodetector
AT guodaqian designandfabricationofhighperformanceingaasnearinfraredphotodetector
AT shenkai designandfabricationofhighperformanceingaasnearinfraredphotodetector
AT chenbaile designandfabricationofhighperformanceingaasnearinfraredphotodetector
AT wujiang designandfabricationofhighperformanceingaasnearinfraredphotodetector