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Amorphous Poly (Aryl Ether Ketones) Containing Methylene Groups with Excellent Thermal Resistance, Dielectric Properties and Mechanical Performance
Low-dielectric constant polymers are widely used in various microelectronic materials. With the development of 5G communication technology, there is an urgent need for polymer materials with low dielectric constant at high frequency, good thermal resistance, and mechanical properties. In this study,...
Autores principales: | , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10650800/ https://www.ncbi.nlm.nih.gov/pubmed/37960010 http://dx.doi.org/10.3390/polym15214330 |
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author | Jiang, Jingwei Wang, Zhichao Sun, Yunlong Qian, Zengxu Cao, Zengwen Wang, Zhipeng Zhou, Guangyuan |
author_facet | Jiang, Jingwei Wang, Zhichao Sun, Yunlong Qian, Zengxu Cao, Zengwen Wang, Zhipeng Zhou, Guangyuan |
author_sort | Jiang, Jingwei |
collection | PubMed |
description | Low-dielectric constant polymers are widely used in various microelectronic materials. With the development of 5G communication technology, there is an urgent need for polymer materials with low dielectric constant at high frequency, good thermal resistance, and mechanical properties. In this study, four novel poly (aryl ether ketone) (PAEK) containing different numbers of methylene groups were synthesized via nucleophilic polycondensation reaction. At 10 GHz, these polymer films exhibit excellent dielectric properties with dielectric constants as low as 2.76. The relationship between the dielectric constant and the number of methylene groups is illustrated by constructing the amorphous accumulation cell model. In addition, methylene groups provided the polymer with favorable mechanical performance, including Young’s modulus in the range of 2.17–2.21 GPa, the tensile strength from 82.0 to 88.5 MPa and the elongation at the break achieved 7.94%, respectively. Simultaneously, the polymer maintains good thermal resistance with a glass transition temperature (T(g)) reaching 216 °C. The result indicates that the obtained novel PAEK is potentially valuable in the field of high-frequency communications. |
format | Online Article Text |
id | pubmed-10650800 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2023 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-106508002023-11-06 Amorphous Poly (Aryl Ether Ketones) Containing Methylene Groups with Excellent Thermal Resistance, Dielectric Properties and Mechanical Performance Jiang, Jingwei Wang, Zhichao Sun, Yunlong Qian, Zengxu Cao, Zengwen Wang, Zhipeng Zhou, Guangyuan Polymers (Basel) Article Low-dielectric constant polymers are widely used in various microelectronic materials. With the development of 5G communication technology, there is an urgent need for polymer materials with low dielectric constant at high frequency, good thermal resistance, and mechanical properties. In this study, four novel poly (aryl ether ketone) (PAEK) containing different numbers of methylene groups were synthesized via nucleophilic polycondensation reaction. At 10 GHz, these polymer films exhibit excellent dielectric properties with dielectric constants as low as 2.76. The relationship between the dielectric constant and the number of methylene groups is illustrated by constructing the amorphous accumulation cell model. In addition, methylene groups provided the polymer with favorable mechanical performance, including Young’s modulus in the range of 2.17–2.21 GPa, the tensile strength from 82.0 to 88.5 MPa and the elongation at the break achieved 7.94%, respectively. Simultaneously, the polymer maintains good thermal resistance with a glass transition temperature (T(g)) reaching 216 °C. The result indicates that the obtained novel PAEK is potentially valuable in the field of high-frequency communications. MDPI 2023-11-06 /pmc/articles/PMC10650800/ /pubmed/37960010 http://dx.doi.org/10.3390/polym15214330 Text en © 2023 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Jiang, Jingwei Wang, Zhichao Sun, Yunlong Qian, Zengxu Cao, Zengwen Wang, Zhipeng Zhou, Guangyuan Amorphous Poly (Aryl Ether Ketones) Containing Methylene Groups with Excellent Thermal Resistance, Dielectric Properties and Mechanical Performance |
title | Amorphous Poly (Aryl Ether Ketones) Containing Methylene Groups with Excellent Thermal Resistance, Dielectric Properties and Mechanical Performance |
title_full | Amorphous Poly (Aryl Ether Ketones) Containing Methylene Groups with Excellent Thermal Resistance, Dielectric Properties and Mechanical Performance |
title_fullStr | Amorphous Poly (Aryl Ether Ketones) Containing Methylene Groups with Excellent Thermal Resistance, Dielectric Properties and Mechanical Performance |
title_full_unstemmed | Amorphous Poly (Aryl Ether Ketones) Containing Methylene Groups with Excellent Thermal Resistance, Dielectric Properties and Mechanical Performance |
title_short | Amorphous Poly (Aryl Ether Ketones) Containing Methylene Groups with Excellent Thermal Resistance, Dielectric Properties and Mechanical Performance |
title_sort | amorphous poly (aryl ether ketones) containing methylene groups with excellent thermal resistance, dielectric properties and mechanical performance |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10650800/ https://www.ncbi.nlm.nih.gov/pubmed/37960010 http://dx.doi.org/10.3390/polym15214330 |
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