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Chemically Stable Styrenic Electrospun Membranes with Tailorable Surface Chemistry

Membranes with tailorable surface chemistry have applications in a wide range of industries. Synthesizing membranes from poly(chloromethyl styrene) directly incorporates an alkyl halide surface-bound initiator which can be used to install functional groups via S(N)2 chemistry or graft polymerization...

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Autores principales: Sepesy, Maura, Banik, Tuli, Scott, Joelle, Venturina, Luke A. F., Johnson, Alec, Schneider, Bernadette L., Sibley, Megan M., Duval, Christine E.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2023
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10673432/
https://www.ncbi.nlm.nih.gov/pubmed/37999356
http://dx.doi.org/10.3390/membranes13110870
_version_ 1785140621415022592
author Sepesy, Maura
Banik, Tuli
Scott, Joelle
Venturina, Luke A. F.
Johnson, Alec
Schneider, Bernadette L.
Sibley, Megan M.
Duval, Christine E.
author_facet Sepesy, Maura
Banik, Tuli
Scott, Joelle
Venturina, Luke A. F.
Johnson, Alec
Schneider, Bernadette L.
Sibley, Megan M.
Duval, Christine E.
author_sort Sepesy, Maura
collection PubMed
description Membranes with tailorable surface chemistry have applications in a wide range of industries. Synthesizing membranes from poly(chloromethyl styrene) directly incorporates an alkyl halide surface-bound initiator which can be used to install functional groups via S(N)2 chemistry or graft polymerization techniques. In this work, poly(chloromethyl styrene) membranes were synthesized through electrospinning. After fabrication, membranes were crosslinked with a diamine, and the chemical resistance of the membranes was evaluated by exposure to 10 M nitric acid, ethanol, or tetrahydrofuran for 24 h. The resulting membranes had diameters on the order of 2–5 microns, porosities of >80%, and permeance on the order of 10,000 L/m(2)/h/bar. Crosslinking the membranes generally increased the chemical stability. The degree of crosslinking was approximated using elemental analysis for nitrogen and ranged from 0.5 to 0.9 N%. The poly(chloromethyl styrene) membrane with the highest degree of crosslinking did not dissolve in THF after 24 h and retained its high permeance after solvent exposure. The presented chemically resistant membranes can serve as a platform technology due to their versatile surface chemistry and can be used in membrane manufacturing techniques that require the membrane to be contacted with organic solvents or monomers. They can also serve as a platform for separations that are performed in strong acids.
format Online
Article
Text
id pubmed-10673432
institution National Center for Biotechnology Information
language English
publishDate 2023
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-106734322023-11-02 Chemically Stable Styrenic Electrospun Membranes with Tailorable Surface Chemistry Sepesy, Maura Banik, Tuli Scott, Joelle Venturina, Luke A. F. Johnson, Alec Schneider, Bernadette L. Sibley, Megan M. Duval, Christine E. Membranes (Basel) Article Membranes with tailorable surface chemistry have applications in a wide range of industries. Synthesizing membranes from poly(chloromethyl styrene) directly incorporates an alkyl halide surface-bound initiator which can be used to install functional groups via S(N)2 chemistry or graft polymerization techniques. In this work, poly(chloromethyl styrene) membranes were synthesized through electrospinning. After fabrication, membranes were crosslinked with a diamine, and the chemical resistance of the membranes was evaluated by exposure to 10 M nitric acid, ethanol, or tetrahydrofuran for 24 h. The resulting membranes had diameters on the order of 2–5 microns, porosities of >80%, and permeance on the order of 10,000 L/m(2)/h/bar. Crosslinking the membranes generally increased the chemical stability. The degree of crosslinking was approximated using elemental analysis for nitrogen and ranged from 0.5 to 0.9 N%. The poly(chloromethyl styrene) membrane with the highest degree of crosslinking did not dissolve in THF after 24 h and retained its high permeance after solvent exposure. The presented chemically resistant membranes can serve as a platform technology due to their versatile surface chemistry and can be used in membrane manufacturing techniques that require the membrane to be contacted with organic solvents or monomers. They can also serve as a platform for separations that are performed in strong acids. MDPI 2023-11-02 /pmc/articles/PMC10673432/ /pubmed/37999356 http://dx.doi.org/10.3390/membranes13110870 Text en © 2023 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Sepesy, Maura
Banik, Tuli
Scott, Joelle
Venturina, Luke A. F.
Johnson, Alec
Schneider, Bernadette L.
Sibley, Megan M.
Duval, Christine E.
Chemically Stable Styrenic Electrospun Membranes with Tailorable Surface Chemistry
title Chemically Stable Styrenic Electrospun Membranes with Tailorable Surface Chemistry
title_full Chemically Stable Styrenic Electrospun Membranes with Tailorable Surface Chemistry
title_fullStr Chemically Stable Styrenic Electrospun Membranes with Tailorable Surface Chemistry
title_full_unstemmed Chemically Stable Styrenic Electrospun Membranes with Tailorable Surface Chemistry
title_short Chemically Stable Styrenic Electrospun Membranes with Tailorable Surface Chemistry
title_sort chemically stable styrenic electrospun membranes with tailorable surface chemistry
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10673432/
https://www.ncbi.nlm.nih.gov/pubmed/37999356
http://dx.doi.org/10.3390/membranes13110870
work_keys_str_mv AT sepesymaura chemicallystablestyrenicelectrospunmembraneswithtailorablesurfacechemistry
AT baniktuli chemicallystablestyrenicelectrospunmembraneswithtailorablesurfacechemistry
AT scottjoelle chemicallystablestyrenicelectrospunmembraneswithtailorablesurfacechemistry
AT venturinalukeaf chemicallystablestyrenicelectrospunmembraneswithtailorablesurfacechemistry
AT johnsonalec chemicallystablestyrenicelectrospunmembraneswithtailorablesurfacechemistry
AT schneiderbernadettel chemicallystablestyrenicelectrospunmembraneswithtailorablesurfacechemistry
AT sibleymeganm chemicallystablestyrenicelectrospunmembraneswithtailorablesurfacechemistry
AT duvalchristinee chemicallystablestyrenicelectrospunmembraneswithtailorablesurfacechemistry