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Determination of X-ray flux using silicon pin diodes

Accurate measurement of photon flux from an X-ray source, a parameter required to calculate the dose absorbed by the sample, is not yet routinely available at macromolecular crystallography beamlines. The development of a model for determining the photon flux incident on pin diodes is described here...

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Detalles Bibliográficos
Autores principales: Owen, Robin L., Holton, James M., Schulze-Briese, Clemens, Garman, Elspeth F.
Formato: Texto
Lenguaje:English
Publicado: International Union of Crystallography 2009
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2651761/
https://www.ncbi.nlm.nih.gov/pubmed/19240326
http://dx.doi.org/10.1107/S0909049508040429
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author Owen, Robin L.
Holton, James M.
Schulze-Briese, Clemens
Garman, Elspeth F.
author_facet Owen, Robin L.
Holton, James M.
Schulze-Briese, Clemens
Garman, Elspeth F.
author_sort Owen, Robin L.
collection PubMed
description Accurate measurement of photon flux from an X-ray source, a parameter required to calculate the dose absorbed by the sample, is not yet routinely available at macromolecular crystallography beamlines. The development of a model for determining the photon flux incident on pin diodes is described here, and has been tested on the macromolecular crystallography beamlines at both the Swiss Light Source, Villigen, Switzerland, and the Advanced Light Source, Berkeley, USA, at energies between 4 and 18 keV. These experiments have shown that a simple model based on energy deposition in silicon is sufficient for determining the flux incident on high-quality silicon pin diodes. The derivation and validation of this model is presented, and a web-based tool for the use of the macromolecular crystallography and wider synchrotron community is introduced.
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spelling pubmed-26517612009-04-02 Determination of X-ray flux using silicon pin diodes Owen, Robin L. Holton, James M. Schulze-Briese, Clemens Garman, Elspeth F. J Synchrotron Radiat Radiation Damage Accurate measurement of photon flux from an X-ray source, a parameter required to calculate the dose absorbed by the sample, is not yet routinely available at macromolecular crystallography beamlines. The development of a model for determining the photon flux incident on pin diodes is described here, and has been tested on the macromolecular crystallography beamlines at both the Swiss Light Source, Villigen, Switzerland, and the Advanced Light Source, Berkeley, USA, at energies between 4 and 18 keV. These experiments have shown that a simple model based on energy deposition in silicon is sufficient for determining the flux incident on high-quality silicon pin diodes. The derivation and validation of this model is presented, and a web-based tool for the use of the macromolecular crystallography and wider synchrotron community is introduced. International Union of Crystallography 2009-03-01 2009-02-25 /pmc/articles/PMC2651761/ /pubmed/19240326 http://dx.doi.org/10.1107/S0909049508040429 Text en © Robin L. Owen et al. 2009 http://creativecommons.org/licenses/by/2.0/uk/ This is an open-access article distributed under the terms of the Creative Commons Attribution Licence, which permits unrestricted use, distribution, and reproduction in any medium, provided the original authors and source are cited.
spellingShingle Radiation Damage
Owen, Robin L.
Holton, James M.
Schulze-Briese, Clemens
Garman, Elspeth F.
Determination of X-ray flux using silicon pin diodes
title Determination of X-ray flux using silicon pin diodes
title_full Determination of X-ray flux using silicon pin diodes
title_fullStr Determination of X-ray flux using silicon pin diodes
title_full_unstemmed Determination of X-ray flux using silicon pin diodes
title_short Determination of X-ray flux using silicon pin diodes
title_sort determination of x-ray flux using silicon pin diodes
topic Radiation Damage
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2651761/
https://www.ncbi.nlm.nih.gov/pubmed/19240326
http://dx.doi.org/10.1107/S0909049508040429
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