A Target Site for Spontaneous Insertion of IS10 Element in pUC19 DNA Located within Intrinsically Bent DNA

Residual insertion sequence elements (IS elements) in Escherichia coli strains that are commonly used for DNA cloning are known to cause cloning artifacts by transposing themselves into the recombinant DNA fragments. In such cases, chance insertion of IS elements may occur at integration sites in th...

Descripción completa

Detalles Bibliográficos
Autores principales: Kobori, Shungo, Ko, Yumi, Kato, Mikio
Formato: Texto
Lenguaje:English
Publicado: Bentham Open 2009
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2758499/
https://www.ncbi.nlm.nih.gov/pubmed/19812719
http://dx.doi.org/10.2174/1874285800903010146

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2758499/
https://www.ncbi.nlm.nih.gov/pubmed/19812719
http://dx.doi.org/10.2174/1874285800903010146

Ejemplares similares