Synchrotron-radiation-stimulated etching of polydimethylsiloxane using XeF(2) as a reaction gas

The synchrotron radiation (SR) stimulated etching of silicon elastomer polydimethylsiloxane (PDMS) using XeF(2) as an etching gas has been demonstrated. An etching system with differential pumps and two parabolic focusing mirrors was constructed to perform the etching. The PDMS was found to be effec...

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Detalles Bibliográficos
Autores principales: Chiang, Tsung-Yi, Makimura, Tetsuya, He, Tingchao, Torii, Shuichi, Yoshida, Tomoko, Tero, Ryugo, Wang, Changshun, Urisu, Tsuneo
Formato: Texto
Lenguaje:English
Publicado: International Union of Crystallography 2010
Materias:
Research Papers
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2797304/
https://www.ncbi.nlm.nih.gov/pubmed/20029113
http://dx.doi.org/10.1107/S0909049509045658

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2797304/
https://www.ncbi.nlm.nih.gov/pubmed/20029113
http://dx.doi.org/10.1107/S0909049509045658

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