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Surfactant-Assisted in situ Chemical Etching for the General Synthesis of ZnO Nanotubes Array

In this paper, a general low-cost and substrate-independent chemical etching strategy is demonstrated for the synthesis of ZnO nanotubes array. During the chemical etching, the nanotubes array inherits many features from the preformed nanorods array, such as the diameter, size distribution, and alig...

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Detalles Bibliográficos
Autores principales: Wang, Hongqiang, Li, Ming, Jia, Lichao, Li, Liang, Wang, Guozhong, Zhang, Yunxia, Li, Guanghai
Formato: Texto
Lenguaje:English
Publicado: Springer 2010
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2893820/
https://www.ncbi.nlm.nih.gov/pubmed/20596467
http://dx.doi.org/10.1007/s11671-010-9608-z
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author Wang, Hongqiang
Li, Ming
Jia, Lichao
Li, Liang
Wang, Guozhong
Zhang, Yunxia
Li, Guanghai
author_facet Wang, Hongqiang
Li, Ming
Jia, Lichao
Li, Liang
Wang, Guozhong
Zhang, Yunxia
Li, Guanghai
author_sort Wang, Hongqiang
collection PubMed
description In this paper, a general low-cost and substrate-independent chemical etching strategy is demonstrated for the synthesis of ZnO nanotubes array. During the chemical etching, the nanotubes array inherits many features from the preformed nanorods array, such as the diameter, size distribution, and alignment. The preferential etching along c axis and the surfactant protection to the lateral surfaces are considered responsible for the formation of ZnO nanotubes. This surfactant-assisted chemical etching strategy is highly expected to advance the research in the ZnO nanotube-based technology.
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spelling pubmed-28938202010-06-30 Surfactant-Assisted in situ Chemical Etching for the General Synthesis of ZnO Nanotubes Array Wang, Hongqiang Li, Ming Jia, Lichao Li, Liang Wang, Guozhong Zhang, Yunxia Li, Guanghai Nanoscale Res Lett Nano Express In this paper, a general low-cost and substrate-independent chemical etching strategy is demonstrated for the synthesis of ZnO nanotubes array. During the chemical etching, the nanotubes array inherits many features from the preformed nanorods array, such as the diameter, size distribution, and alignment. The preferential etching along c axis and the surfactant protection to the lateral surfaces are considered responsible for the formation of ZnO nanotubes. This surfactant-assisted chemical etching strategy is highly expected to advance the research in the ZnO nanotube-based technology. Springer 2010-04-24 /pmc/articles/PMC2893820/ /pubmed/20596467 http://dx.doi.org/10.1007/s11671-010-9608-z Text en Copyright © 2010 The Author(s) https://creativecommons.org/licenses/by-nc/4.0/ This article is distributed under the terms of the Creative Commons Attribution Noncommercial License which permits any noncommercial use, distribution, and reproduction in any medium, provided the original author(s) and source are credited.
spellingShingle Nano Express
Wang, Hongqiang
Li, Ming
Jia, Lichao
Li, Liang
Wang, Guozhong
Zhang, Yunxia
Li, Guanghai
Surfactant-Assisted in situ Chemical Etching for the General Synthesis of ZnO Nanotubes Array
title Surfactant-Assisted in situ Chemical Etching for the General Synthesis of ZnO Nanotubes Array
title_full Surfactant-Assisted in situ Chemical Etching for the General Synthesis of ZnO Nanotubes Array
title_fullStr Surfactant-Assisted in situ Chemical Etching for the General Synthesis of ZnO Nanotubes Array
title_full_unstemmed Surfactant-Assisted in situ Chemical Etching for the General Synthesis of ZnO Nanotubes Array
title_short Surfactant-Assisted in situ Chemical Etching for the General Synthesis of ZnO Nanotubes Array
title_sort surfactant-assisted in situ chemical etching for the general synthesis of zno nanotubes array
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2893820/
https://www.ncbi.nlm.nih.gov/pubmed/20596467
http://dx.doi.org/10.1007/s11671-010-9608-z
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