Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application

We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160–200 nm and a height of 140–150...

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Detalles Bibliográficos
Autores principales: Sahoo, KartikaChandra, Lin, Men-Ku, Chang, Edward-Yi, Lu, Yi-Yao, Chen, Chun-Chi, Huang, Jin-Hua, Chang, Chun-Wei
Formato: Texto
Lenguaje:English
Publicado: Springer 2009
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2893968/
https://www.ncbi.nlm.nih.gov/pubmed/20596409
http://dx.doi.org/10.1007/s11671-009-9297-7
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author Sahoo, KartikaChandra
Lin, Men-Ku
Chang, Edward-Yi
Lu, Yi-Yao
Chen, Chun-Chi
Huang, Jin-Hua
Chang, Chun-Wei
author_facet Sahoo, KartikaChandra
Lin, Men-Ku
Chang, Edward-Yi
Lu, Yi-Yao
Chen, Chun-Chi
Huang, Jin-Hua
Chang, Chun-Wei
author_sort Sahoo, KartikaChandra
collection PubMed
description We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160–200 nm and a height of 140–150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen.
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spelling pubmed-28939682010-06-30 Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application Sahoo, KartikaChandra Lin, Men-Ku Chang, Edward-Yi Lu, Yi-Yao Chen, Chun-Chi Huang, Jin-Hua Chang, Chun-Wei Nanoscale Res Lett Nano Express We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160–200 nm and a height of 140–150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen. Springer 2009-04-22 /pmc/articles/PMC2893968/ /pubmed/20596409 http://dx.doi.org/10.1007/s11671-009-9297-7 Text en Copyright © 2009 to the authors
spellingShingle Nano Express
Sahoo, KartikaChandra
Lin, Men-Ku
Chang, Edward-Yi
Lu, Yi-Yao
Chen, Chun-Chi
Huang, Jin-Hua
Chang, Chun-Wei
Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application
title Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application
title_full Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application
title_fullStr Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application
title_full_unstemmed Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application
title_short Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application
title_sort fabrication of antireflective sub-wavelength structures on silicon nitride using nano cluster mask for solar cell application
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2893968/
https://www.ncbi.nlm.nih.gov/pubmed/20596409
http://dx.doi.org/10.1007/s11671-009-9297-7
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