Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application

We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160–200 nm and a height of 140–150...

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Detalles Bibliográficos
Autores principales: Sahoo, KartikaChandra, Lin, Men-Ku, Chang, Edward-Yi, Lu, Yi-Yao, Chen, Chun-Chi, Huang, Jin-Hua, Chang, Chun-Wei
Formato: Texto
Lenguaje:English
Publicado: Springer 2009
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2893968/
https://www.ncbi.nlm.nih.gov/pubmed/20596409
http://dx.doi.org/10.1007/s11671-009-9297-7

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2893968/
https://www.ncbi.nlm.nih.gov/pubmed/20596409
http://dx.doi.org/10.1007/s11671-009-9297-7

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