Cargando…
Synthesis of Tin Nitride Sn(x)N(y)Nanowires by Chemical Vapour Deposition
Tin nitride (Sn(x)N(y)) nanowires have been grown for the first time by chemical vapour deposition on n-type Si(111) and in particular by nitridation of Sn containing NH(4)Cl at 450 °C under a steady flow of NH(3). The Sn(x)N(y)nanowires have an average diameter of 200 nm and lengths ≥5 μm and were...
Autores principales: | Zervos, Matthew, Othonos, Andreas |
---|---|
Formato: | Texto |
Lenguaje: | English |
Publicado: |
Springer
2009
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2894173/ https://www.ncbi.nlm.nih.gov/pubmed/20596341 http://dx.doi.org/10.1007/s11671-009-9364-0 |
Ejemplares similares
-
The nitridation of ZnO nanowires
por: Zervos, Matthew, et al.
Publicado: (2012) -
Tin Oxide Nanowires: The Influence of Trap States on Ultrafast Carrier Relaxation
por: Othonos, Andreas, et al.
Publicado: (2009) -
Low Temperature Growth of In(2)O(3)and InN Nanocrystals on Si(111) via Chemical Vapour Deposition Based on the Sublimation of NH(4)Cl in In
por: Zervos, Matthew, et al.
Publicado: (2009) -
Gallium hydride vapor phase epitaxy of GaN nanowires
por: Zervos, Matthew, et al.
Publicado: (2011) -
An investigation into the conversion of In(2)O(3 )into InN nanowires
por: Papageorgiou, Polina, et al.
Publicado: (2011)