Binary Mixtures of SH- and CH(3)-Terminated Self-Assembled Monolayers to Control the Average Spacing Between Aligned Gold Nanoparticles

This paper presents a method to control the average spacing between organometallic chemical vapor deposition (OMCVD) grown gold nanoparticles (Au NPs) in a line. Focused ion beam patterned CH(3)-terminated self-assembled monolayers are refilled systematically with different mixtures of SH- and CH(3)...

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Detalles Bibliográficos
Autores principales: Rezaee, Asad, Pavelka, Laura C, Mittler, Silvia
Formato: Texto
Lenguaje:English
Publicado: Springer 2009
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2894174/
https://www.ncbi.nlm.nih.gov/pubmed/20628461
http://dx.doi.org/10.1007/s11671-009-9399-2
Descripción
Sumario:This paper presents a method to control the average spacing between organometallic chemical vapor deposition (OMCVD) grown gold nanoparticles (Au NPs) in a line. Focused ion beam patterned CH(3)-terminated self-assembled monolayers are refilled systematically with different mixtures of SH- and CH(3)-terminated silanes. The average spacing between OMCVD Au NPs is demonstrated systematically to decrease by increasing the v/v% ratio of the thiols in the binary silane mixtures with SH- and CH(3)-terminated groups.

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