Cargando…
Pores in n-Type InP: A Model System for Electrochemical Pore Etching
The growth mechanism of currentline-oriented pores in n-type InP has been studied by Fast-Fourier-Transform Impedance Spectroscopy (FFT IS) applied in situ during pore etching and by theoretical calculations. Several pore growth parameters could thus be extracted in situ that are otherwise not obtai...
Autores principales: | Leisner, Malte, Carstensen, Jürgen, Föll, Helmut |
---|---|
Formato: | Texto |
Lenguaje: | English |
Publicado: |
Springer
2010
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2894204/ https://www.ncbi.nlm.nih.gov/pubmed/20596354 http://dx.doi.org/10.1007/s11671-010-9624-z |
Ejemplares similares
-
Electrochemical and galvanic fabrication of a magnetoelectric composite sensor based on InP
por: Gerngross, Mark-Daniel, et al.
Publicado: (2012) -
Electrochemical growth of Co nanowires in ultra-high aspect ratio InP membranes: FFT-impedance spectroscopy of the growth process and magnetic properties
por: Gerngross, Mark-Daniel, et al.
Publicado: (2014) -
New Applications of Electrochemically Produced Porous Semiconductors and Nanowire Arrays
por: Leisner, Malte, et al.
Publicado: (2010) -
Analysis of p-Si macropore etching using FFT-impedance spectroscopy
por: Ossei-Wusu, Emmanuel, et al.
Publicado: (2012) -
Triangle pore arrays fabricated on Si (111) substrate by sphere lithography combined with metal-assisted chemical etching and anisotropic chemical etching
por: Asoh, Hidetaka, et al.
Publicado: (2012)