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Considerable Enhancement of Field Emission of SnO(2)Nanowires by Post-Annealing Process in Oxygen at High Temperature
The field emission properties of SnO(2)nanowires fabricated by chemical vapor deposition with metallic catalyst-assistance were investigated. For the as-fabricated SnO(2)nanowires, the turn-on and threshold field were 4.03 and 5.4 V/μm, respectively. Considerable enhancement of field emission of SnO...
Autores principales: | , , , , , , |
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Formato: | Texto |
Lenguaje: | English |
Publicado: |
Springer
2009
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC2894354/ https://www.ncbi.nlm.nih.gov/pubmed/20596286 http://dx.doi.org/10.1007/s11671-009-9367-x |
Sumario: | The field emission properties of SnO(2)nanowires fabricated by chemical vapor deposition with metallic catalyst-assistance were investigated. For the as-fabricated SnO(2)nanowires, the turn-on and threshold field were 4.03 and 5.4 V/μm, respectively. Considerable enhancement of field emission of SnO(2)nanowires was obtained by a post-annealing process in oxygen at high temperature. When the SnO(2)nanowires were post-annealed at 1,000 °C in oxygen, the turn-on and threshold field were decreased to 3.77 and 4.4 V/μm, respectively, and the current density was increased to 6.58 from 0.3 mA/cm(2)at the same applied electric field of 5.0 V/μm. |
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