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Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations

This study examined the effect of four margin designs on marginal adaptation of Captek crowns during selected processing steps. Twenty-four Captek crowns were fabricated, six each of four margin designs: shoulder (Group A), chamfer (Group B), chamfer with bevel (Group C), and shoulder with bevel (Gr...

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Autores principales: Shih, Amy, Flinton, Robert, Vaidyanathan, Jayalakshmi, Vaidyanathan, Tritala
Formato: Online Artículo Texto
Lenguaje:English
Publicado: International Scholarly Research Network 2011
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3170035/
https://www.ncbi.nlm.nih.gov/pubmed/21991488
http://dx.doi.org/10.5402/2011/810565
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author Shih, Amy
Flinton, Robert
Vaidyanathan, Jayalakshmi
Vaidyanathan, Tritala
author_facet Shih, Amy
Flinton, Robert
Vaidyanathan, Jayalakshmi
Vaidyanathan, Tritala
author_sort Shih, Amy
collection PubMed
description This study examined the effect of four margin designs on marginal adaptation of Captek crowns during selected processing steps. Twenty-four Captek crowns were fabricated, six each of four margin designs: shoulder (Group A), chamfer (Group B), chamfer with bevel (Group C), and shoulder with bevel (Group D). Marginal discrepancies between crowns and matching dies were measured at selected points for each sample at the coping stage (Stage 1), following porcelain application (Stage 2) and cementation (Stage 3). Digital imaging methods were used to measure marginal gap. The results indicate decreasing trend of margin gap as a function of margin design in the order A>B>C>D. Between processing steps, the trend was in the order Stage 3 < Stage 1 < Stage 2. Porcelain firing had no significant effect on marginal adaptation, but cementation decreased the marginal gap. Generally, the margin gap in Captek restorations were in all cases less than the reported acceptable range of margin gaps for ceramometal restorations. These results are clinically favorable outcomes and may be associated with the ductility and burnishability of matrix phase in Captek metal coping margins.
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spelling pubmed-31700352011-10-11 Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations Shih, Amy Flinton, Robert Vaidyanathan, Jayalakshmi Vaidyanathan, Tritala ISRN Dent Research Article This study examined the effect of four margin designs on marginal adaptation of Captek crowns during selected processing steps. Twenty-four Captek crowns were fabricated, six each of four margin designs: shoulder (Group A), chamfer (Group B), chamfer with bevel (Group C), and shoulder with bevel (Group D). Marginal discrepancies between crowns and matching dies were measured at selected points for each sample at the coping stage (Stage 1), following porcelain application (Stage 2) and cementation (Stage 3). Digital imaging methods were used to measure marginal gap. The results indicate decreasing trend of margin gap as a function of margin design in the order A>B>C>D. Between processing steps, the trend was in the order Stage 3 < Stage 1 < Stage 2. Porcelain firing had no significant effect on marginal adaptation, but cementation decreased the marginal gap. Generally, the margin gap in Captek restorations were in all cases less than the reported acceptable range of margin gaps for ceramometal restorations. These results are clinically favorable outcomes and may be associated with the ductility and burnishability of matrix phase in Captek metal coping margins. International Scholarly Research Network 2011 2011-06-08 /pmc/articles/PMC3170035/ /pubmed/21991488 http://dx.doi.org/10.5402/2011/810565 Text en Copyright © 2011 Amy Shih et al. https://creativecommons.org/licenses/by/3.0/ This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
spellingShingle Research Article
Shih, Amy
Flinton, Robert
Vaidyanathan, Jayalakshmi
Vaidyanathan, Tritala
Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations
title Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations
title_full Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations
title_fullStr Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations
title_full_unstemmed Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations
title_short Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations
title_sort effect of margin design and processing steps on marginal adaptation of captek restorations
topic Research Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3170035/
https://www.ncbi.nlm.nih.gov/pubmed/21991488
http://dx.doi.org/10.5402/2011/810565
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