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Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations
This study examined the effect of four margin designs on marginal adaptation of Captek crowns during selected processing steps. Twenty-four Captek crowns were fabricated, six each of four margin designs: shoulder (Group A), chamfer (Group B), chamfer with bevel (Group C), and shoulder with bevel (Gr...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
International Scholarly Research Network
2011
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3170035/ https://www.ncbi.nlm.nih.gov/pubmed/21991488 http://dx.doi.org/10.5402/2011/810565 |
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author | Shih, Amy Flinton, Robert Vaidyanathan, Jayalakshmi Vaidyanathan, Tritala |
author_facet | Shih, Amy Flinton, Robert Vaidyanathan, Jayalakshmi Vaidyanathan, Tritala |
author_sort | Shih, Amy |
collection | PubMed |
description | This study examined the effect of four margin designs on marginal adaptation of Captek crowns during selected processing steps. Twenty-four Captek crowns were fabricated, six each of four margin designs: shoulder (Group A), chamfer (Group B), chamfer with bevel (Group C), and shoulder with bevel (Group D). Marginal discrepancies between crowns and matching dies were measured at selected points for each sample at the coping stage (Stage 1), following porcelain application (Stage 2) and cementation (Stage 3). Digital imaging methods were used to measure marginal gap. The results indicate decreasing trend of margin gap as a function of margin design in the order A>B>C>D. Between processing steps, the trend was in the order Stage 3 < Stage 1 < Stage 2. Porcelain firing had no significant effect on marginal adaptation, but cementation decreased the marginal gap. Generally, the margin gap in Captek restorations were in all cases less than the reported acceptable range of margin gaps for ceramometal restorations. These results are clinically favorable outcomes and may be associated with the ductility and burnishability of matrix phase in Captek metal coping margins. |
format | Online Article Text |
id | pubmed-3170035 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2011 |
publisher | International Scholarly Research Network |
record_format | MEDLINE/PubMed |
spelling | pubmed-31700352011-10-11 Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations Shih, Amy Flinton, Robert Vaidyanathan, Jayalakshmi Vaidyanathan, Tritala ISRN Dent Research Article This study examined the effect of four margin designs on marginal adaptation of Captek crowns during selected processing steps. Twenty-four Captek crowns were fabricated, six each of four margin designs: shoulder (Group A), chamfer (Group B), chamfer with bevel (Group C), and shoulder with bevel (Group D). Marginal discrepancies between crowns and matching dies were measured at selected points for each sample at the coping stage (Stage 1), following porcelain application (Stage 2) and cementation (Stage 3). Digital imaging methods were used to measure marginal gap. The results indicate decreasing trend of margin gap as a function of margin design in the order A>B>C>D. Between processing steps, the trend was in the order Stage 3 < Stage 1 < Stage 2. Porcelain firing had no significant effect on marginal adaptation, but cementation decreased the marginal gap. Generally, the margin gap in Captek restorations were in all cases less than the reported acceptable range of margin gaps for ceramometal restorations. These results are clinically favorable outcomes and may be associated with the ductility and burnishability of matrix phase in Captek metal coping margins. International Scholarly Research Network 2011 2011-06-08 /pmc/articles/PMC3170035/ /pubmed/21991488 http://dx.doi.org/10.5402/2011/810565 Text en Copyright © 2011 Amy Shih et al. https://creativecommons.org/licenses/by/3.0/ This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. |
spellingShingle | Research Article Shih, Amy Flinton, Robert Vaidyanathan, Jayalakshmi Vaidyanathan, Tritala Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations |
title | Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations |
title_full | Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations |
title_fullStr | Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations |
title_full_unstemmed | Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations |
title_short | Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations |
title_sort | effect of margin design and processing steps on marginal adaptation of captek restorations |
topic | Research Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3170035/ https://www.ncbi.nlm.nih.gov/pubmed/21991488 http://dx.doi.org/10.5402/2011/810565 |
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