Polycrystallization effects on the nanoscale electrical properties of high-k dielectrics

In this study, atomic force microscopy-related techniques have been used to investigate, at the nanoscale, how the polycrystallization of an Al(2)O(3)-based gate stack, after a thermal annealing process, affects the variability of its electrical properties. The impact of an electrical stress on the...

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Detalles Bibliográficos
Autores principales: Lanza, Mario, Iglesias, Vanessa, Porti, Marc, Nafria, Montse, Aymerich, Xavier
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2011
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3211152/
https://www.ncbi.nlm.nih.gov/pubmed/21711617
http://dx.doi.org/10.1186/1556-276X-6-108
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author Lanza, Mario
Iglesias, Vanessa
Porti, Marc
Nafria, Montse
Aymerich, Xavier
author_facet Lanza, Mario
Iglesias, Vanessa
Porti, Marc
Nafria, Montse
Aymerich, Xavier
author_sort Lanza, Mario
collection PubMed
description In this study, atomic force microscopy-related techniques have been used to investigate, at the nanoscale, how the polycrystallization of an Al(2)O(3)-based gate stack, after a thermal annealing process, affects the variability of its electrical properties. The impact of an electrical stress on the electrical conduction and the charge trapping of amorphous and polycrystalline Al(2)O(3 )layers have been also analyzed.
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spelling pubmed-32111522011-11-09 Polycrystallization effects on the nanoscale electrical properties of high-k dielectrics Lanza, Mario Iglesias, Vanessa Porti, Marc Nafria, Montse Aymerich, Xavier Nanoscale Res Lett Nano Express In this study, atomic force microscopy-related techniques have been used to investigate, at the nanoscale, how the polycrystallization of an Al(2)O(3)-based gate stack, after a thermal annealing process, affects the variability of its electrical properties. The impact of an electrical stress on the electrical conduction and the charge trapping of amorphous and polycrystalline Al(2)O(3 )layers have been also analyzed. Springer 2011-01-31 /pmc/articles/PMC3211152/ /pubmed/21711617 http://dx.doi.org/10.1186/1556-276X-6-108 Text en Copyright ©2011 Lanza et al; licensee Springer. http://creativecommons.org/licenses/by/2.0 This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
spellingShingle Nano Express
Lanza, Mario
Iglesias, Vanessa
Porti, Marc
Nafria, Montse
Aymerich, Xavier
Polycrystallization effects on the nanoscale electrical properties of high-k dielectrics
title Polycrystallization effects on the nanoscale electrical properties of high-k dielectrics
title_full Polycrystallization effects on the nanoscale electrical properties of high-k dielectrics
title_fullStr Polycrystallization effects on the nanoscale electrical properties of high-k dielectrics
title_full_unstemmed Polycrystallization effects on the nanoscale electrical properties of high-k dielectrics
title_short Polycrystallization effects on the nanoscale electrical properties of high-k dielectrics
title_sort polycrystallization effects on the nanoscale electrical properties of high-k dielectrics
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3211152/
https://www.ncbi.nlm.nih.gov/pubmed/21711617
http://dx.doi.org/10.1186/1556-276X-6-108
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AT nafriamontse polycrystallizationeffectsonthenanoscaleelectricalpropertiesofhighkdielectrics
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