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Micro-nano hybrid structures with manipulated wettability using a two-step silicon etching on a large area

Nanoscale surface manipulation technique to control the surface roughness and the wettability is a challenging field for performance enhancement in boiling heat transfer. In this study, micro-nano hybrid structures (MNHS) with hierarchical geometries that lead to maximizing of surface area, roughnes...

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Autores principales: Kim, Beom Seok, Shin, Sangwoo, Shin, Seung Jae, Kim, Kyung Min, Cho, Hyung Hee
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2011
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3211421/
https://www.ncbi.nlm.nih.gov/pubmed/21711859
http://dx.doi.org/10.1186/1556-276X-6-333
_version_ 1782215863316774912
author Kim, Beom Seok
Shin, Sangwoo
Shin, Seung Jae
Kim, Kyung Min
Cho, Hyung Hee
author_facet Kim, Beom Seok
Shin, Sangwoo
Shin, Seung Jae
Kim, Kyung Min
Cho, Hyung Hee
author_sort Kim, Beom Seok
collection PubMed
description Nanoscale surface manipulation technique to control the surface roughness and the wettability is a challenging field for performance enhancement in boiling heat transfer. In this study, micro-nano hybrid structures (MNHS) with hierarchical geometries that lead to maximizing of surface area, roughness, and wettability are developed for the boiling applications. MNHS structures consist of micropillars or microcavities along with nanowires having the length to diameter ratio of about 100:1. MNHS is fabricated by a two-step silicon etching process, which are dry etching for micropattern and electroless silicon wet etching for nanowire synthesis. The fabrication process is readily capable of producing MNHS covering a wafer-scale area. By controlling the removal of polymeric passivation layers deposited during silicon dry etching (Bosch process), we can control the geometries for the hierarchical structure with or without the thin hydrophobic barriers that affect surface wettability. MNHS without sidewalls exhibit superhydrophilic behavior with a contact angle under 10°, whereas those with sidewalls preserved by the passivation layer display more hydrophobic characteristics with a contact angle near 60°.
format Online
Article
Text
id pubmed-3211421
institution National Center for Biotechnology Information
language English
publishDate 2011
publisher Springer
record_format MEDLINE/PubMed
spelling pubmed-32114212011-11-09 Micro-nano hybrid structures with manipulated wettability using a two-step silicon etching on a large area Kim, Beom Seok Shin, Sangwoo Shin, Seung Jae Kim, Kyung Min Cho, Hyung Hee Nanoscale Res Lett Nano Express Nanoscale surface manipulation technique to control the surface roughness and the wettability is a challenging field for performance enhancement in boiling heat transfer. In this study, micro-nano hybrid structures (MNHS) with hierarchical geometries that lead to maximizing of surface area, roughness, and wettability are developed for the boiling applications. MNHS structures consist of micropillars or microcavities along with nanowires having the length to diameter ratio of about 100:1. MNHS is fabricated by a two-step silicon etching process, which are dry etching for micropattern and electroless silicon wet etching for nanowire synthesis. The fabrication process is readily capable of producing MNHS covering a wafer-scale area. By controlling the removal of polymeric passivation layers deposited during silicon dry etching (Bosch process), we can control the geometries for the hierarchical structure with or without the thin hydrophobic barriers that affect surface wettability. MNHS without sidewalls exhibit superhydrophilic behavior with a contact angle under 10°, whereas those with sidewalls preserved by the passivation layer display more hydrophobic characteristics with a contact angle near 60°. Springer 2011-04-14 /pmc/articles/PMC3211421/ /pubmed/21711859 http://dx.doi.org/10.1186/1556-276X-6-333 Text en Copyright ©2011 Kim et al; licensee Springer. http://creativecommons.org/licenses/by/2.0 This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
spellingShingle Nano Express
Kim, Beom Seok
Shin, Sangwoo
Shin, Seung Jae
Kim, Kyung Min
Cho, Hyung Hee
Micro-nano hybrid structures with manipulated wettability using a two-step silicon etching on a large area
title Micro-nano hybrid structures with manipulated wettability using a two-step silicon etching on a large area
title_full Micro-nano hybrid structures with manipulated wettability using a two-step silicon etching on a large area
title_fullStr Micro-nano hybrid structures with manipulated wettability using a two-step silicon etching on a large area
title_full_unstemmed Micro-nano hybrid structures with manipulated wettability using a two-step silicon etching on a large area
title_short Micro-nano hybrid structures with manipulated wettability using a two-step silicon etching on a large area
title_sort micro-nano hybrid structures with manipulated wettability using a two-step silicon etching on a large area
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3211421/
https://www.ncbi.nlm.nih.gov/pubmed/21711859
http://dx.doi.org/10.1186/1556-276X-6-333
work_keys_str_mv AT kimbeomseok micronanohybridstructureswithmanipulatedwettabilityusingatwostepsiliconetchingonalargearea
AT shinsangwoo micronanohybridstructureswithmanipulatedwettabilityusingatwostepsiliconetchingonalargearea
AT shinseungjae micronanohybridstructureswithmanipulatedwettabilityusingatwostepsiliconetchingonalargearea
AT kimkyungmin micronanohybridstructureswithmanipulatedwettabilityusingatwostepsiliconetchingonalargearea
AT chohyunghee micronanohybridstructureswithmanipulatedwettabilityusingatwostepsiliconetchingonalargearea