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Thickness-dependent optimization of Er(3+ )light emission from silicon-rich silicon oxide thin films

This study investigates the influence of the film thickness on the silicon-excess-mediated sensitization of Erbium ions in Si-rich silica. The Er(3+ )photoluminescence at 1.5 μm, normalized to the film thickness, was found five times larger for films 1 μm-thick than that from 50-nm-thick films inten...

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Detalles Bibliográficos
Autores principales: Cueff, Sébastien, Labbé, Christophe, Jambois, Olivier, Garrido, Blas, Portier, Xavier, Rizk, Richard
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2011
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3211489/
https://www.ncbi.nlm.nih.gov/pubmed/21711930
http://dx.doi.org/10.1186/1556-276X-6-395