Hybrid FIB milling strategy for the fabrication of plasmonic nanostructures on semiconductor substrates

The optical properties of plasmonic semiconductor devices fabricated by focused ion beam (FIB) milling deteriorate because of the amorphisation of the semiconductor substrate. This study explores the effects of combining traditional 30 kV FIB milling with 5 kV FIB patterning to minimise the semicond...

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Detalles Bibliográficos
Autores principales: Einsle, Joshua F, Bouillard, Jean-Sebastien, Dickson, Wayne, Zayats, Anatoly V
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2011
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3234295/
https://www.ncbi.nlm.nih.gov/pubmed/22040004
http://dx.doi.org/10.1186/1556-276X-6-572

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3234295/
https://www.ncbi.nlm.nih.gov/pubmed/22040004
http://dx.doi.org/10.1186/1556-276X-6-572

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