Cargando…
Hybrid FIB milling strategy for the fabrication of plasmonic nanostructures on semiconductor substrates
The optical properties of plasmonic semiconductor devices fabricated by focused ion beam (FIB) milling deteriorate because of the amorphisation of the semiconductor substrate. This study explores the effects of combining traditional 30 kV FIB milling with 5 kV FIB patterning to minimise the semicond...
| Autores principales: | , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer
2011
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3234295/ https://www.ncbi.nlm.nih.gov/pubmed/22040004 http://dx.doi.org/10.1186/1556-276X-6-572 |