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Maskless Plasmonic Lithography at 22 nm Resolution
Optical imaging and photolithography promise broad applications in nano-electronics, metrologies, and single-molecule biology. Light diffraction however sets a fundamental limit on optical resolution, and it poses a critical challenge to the down-scaling of nano-scale manufacturing. Surface plasmons...
Autores principales: | , , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2011
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3240963/ https://www.ncbi.nlm.nih.gov/pubmed/22355690 http://dx.doi.org/10.1038/srep00175 |
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author | Pan, Liang Park, Yongshik Xiong, Yi Ulin-Avila, Erick Wang, Yuan Zeng, Li Xiong, Shaomin Rho, Junsuk Sun, Cheng Bogy, David B. Zhang, Xiang |
author_facet | Pan, Liang Park, Yongshik Xiong, Yi Ulin-Avila, Erick Wang, Yuan Zeng, Li Xiong, Shaomin Rho, Junsuk Sun, Cheng Bogy, David B. Zhang, Xiang |
author_sort | Pan, Liang |
collection | PubMed |
description | Optical imaging and photolithography promise broad applications in nano-electronics, metrologies, and single-molecule biology. Light diffraction however sets a fundamental limit on optical resolution, and it poses a critical challenge to the down-scaling of nano-scale manufacturing. Surface plasmons have been used to circumvent the diffraction limit as they have shorter wavelengths. However, this approach has a trade-off between resolution and energy efficiency that arises from the substantial momentum mismatch. Here we report a novel multi-stage scheme that is capable of efficiently compressing the optical energy at deep sub-wavelength scales through the progressive coupling of propagating surface plasmons (PSPs) and localized surface plasmons (LSPs). Combining this with airbearing surface technology, we demonstrate a plasmonic lithography with 22 nm half-pitch resolution at scanning speeds up to 10 m/s. This low-cost scheme has the potential of higher throughput than current photolithography, and it opens a new approach towards the next generation semiconductor manufacturing. |
format | Online Article Text |
id | pubmed-3240963 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2011 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-32409632011-12-22 Maskless Plasmonic Lithography at 22 nm Resolution Pan, Liang Park, Yongshik Xiong, Yi Ulin-Avila, Erick Wang, Yuan Zeng, Li Xiong, Shaomin Rho, Junsuk Sun, Cheng Bogy, David B. Zhang, Xiang Sci Rep Article Optical imaging and photolithography promise broad applications in nano-electronics, metrologies, and single-molecule biology. Light diffraction however sets a fundamental limit on optical resolution, and it poses a critical challenge to the down-scaling of nano-scale manufacturing. Surface plasmons have been used to circumvent the diffraction limit as they have shorter wavelengths. However, this approach has a trade-off between resolution and energy efficiency that arises from the substantial momentum mismatch. Here we report a novel multi-stage scheme that is capable of efficiently compressing the optical energy at deep sub-wavelength scales through the progressive coupling of propagating surface plasmons (PSPs) and localized surface plasmons (LSPs). Combining this with airbearing surface technology, we demonstrate a plasmonic lithography with 22 nm half-pitch resolution at scanning speeds up to 10 m/s. This low-cost scheme has the potential of higher throughput than current photolithography, and it opens a new approach towards the next generation semiconductor manufacturing. Nature Publishing Group 2011-11-29 /pmc/articles/PMC3240963/ /pubmed/22355690 http://dx.doi.org/10.1038/srep00175 Text en Copyright © 2011, Macmillan Publishers Limited. All rights reserved http://creativecommons.org/licenses/by-nc-sa/3.0/ This work is licensed under a Creative Commons Attribution-NonCommercial-ShareALike 3.0 Unported License. To view a copy of this license, visit http://creativecommons.org/licenses/by-nc-sa/3.0/ |
spellingShingle | Article Pan, Liang Park, Yongshik Xiong, Yi Ulin-Avila, Erick Wang, Yuan Zeng, Li Xiong, Shaomin Rho, Junsuk Sun, Cheng Bogy, David B. Zhang, Xiang Maskless Plasmonic Lithography at 22 nm Resolution |
title | Maskless Plasmonic Lithography at 22 nm Resolution |
title_full | Maskless Plasmonic Lithography at 22 nm Resolution |
title_fullStr | Maskless Plasmonic Lithography at 22 nm Resolution |
title_full_unstemmed | Maskless Plasmonic Lithography at 22 nm Resolution |
title_short | Maskless Plasmonic Lithography at 22 nm Resolution |
title_sort | maskless plasmonic lithography at 22 nm resolution |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3240963/ https://www.ncbi.nlm.nih.gov/pubmed/22355690 http://dx.doi.org/10.1038/srep00175 |
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