The Influences of H(2)Plasma Pretreatment on the Growth of Vertically Aligned Carbon Nanotubes by Microwave Plasma Chemical Vapor Deposition

The effects of H(2)flow rate during plasma pretreatment on synthesizing the multiwalled carbon nanotubes (MWCNTs) by using the microwave plasma chemical vapor deposition are investigated in this study. A H(2)and CH(4)gas mixture with a 9:1 ratio was used as a precursor for the synthesis of MWCNT on...

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Detalles Bibliográficos
Autores principales: Jian, Sheng-Rui, Chen, Yuan-Tsung, Wang, Chih-Feng, Wen, Hua-Chiang, Chiu, Wei-Ming, Yang, Chu-Shou
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2008
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3244812/
http://dx.doi.org/10.1007/s11671-008-9141-5

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3244812/
http://dx.doi.org/10.1007/s11671-008-9141-5

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