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Ge-Photodetectors for Si-Based Optoelectronic Integration

High speed photodetectors are a key building block, which allow a large wavelength range of detection from 850 nm to telecommunication standards at optical fiber band passes of 1.3–1.55 μm. Such devices are key components in several applications such as local area networks, board to board, chip to c...

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Detalles Bibliográficos
Autores principales: Wang, Jian, Lee, Sungjoo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Molecular Diversity Preservation International (MDPI) 2011
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3274083/
https://www.ncbi.nlm.nih.gov/pubmed/22346598
http://dx.doi.org/10.3390/s110100696
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author Wang, Jian
Lee, Sungjoo
author_facet Wang, Jian
Lee, Sungjoo
author_sort Wang, Jian
collection PubMed
description High speed photodetectors are a key building block, which allow a large wavelength range of detection from 850 nm to telecommunication standards at optical fiber band passes of 1.3–1.55 μm. Such devices are key components in several applications such as local area networks, board to board, chip to chip and intrachip interconnects. Recent technological achievements in growth of high quality SiGe/Ge films on Si wafers have opened up the possibility of low cost Ge-based photodetectors for near infrared communication bands and high resolution spectral imaging with high quantum efficiencies. In this review article, the recent progress in the development and integration of Ge-photodetectors on Si-based photonics will be comprehensively reviewed, along with remaining technological issues to be overcome and future research trends.
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spelling pubmed-32740832012-02-15 Ge-Photodetectors for Si-Based Optoelectronic Integration Wang, Jian Lee, Sungjoo Sensors (Basel) Review High speed photodetectors are a key building block, which allow a large wavelength range of detection from 850 nm to telecommunication standards at optical fiber band passes of 1.3–1.55 μm. Such devices are key components in several applications such as local area networks, board to board, chip to chip and intrachip interconnects. Recent technological achievements in growth of high quality SiGe/Ge films on Si wafers have opened up the possibility of low cost Ge-based photodetectors for near infrared communication bands and high resolution spectral imaging with high quantum efficiencies. In this review article, the recent progress in the development and integration of Ge-photodetectors on Si-based photonics will be comprehensively reviewed, along with remaining technological issues to be overcome and future research trends. Molecular Diversity Preservation International (MDPI) 2011-01-12 /pmc/articles/PMC3274083/ /pubmed/22346598 http://dx.doi.org/10.3390/s110100696 Text en © 2011 by the authors; licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution license (http://creativecommons.org/licenses/by/3.0/).
spellingShingle Review
Wang, Jian
Lee, Sungjoo
Ge-Photodetectors for Si-Based Optoelectronic Integration
title Ge-Photodetectors for Si-Based Optoelectronic Integration
title_full Ge-Photodetectors for Si-Based Optoelectronic Integration
title_fullStr Ge-Photodetectors for Si-Based Optoelectronic Integration
title_full_unstemmed Ge-Photodetectors for Si-Based Optoelectronic Integration
title_short Ge-Photodetectors for Si-Based Optoelectronic Integration
title_sort ge-photodetectors for si-based optoelectronic integration
topic Review
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3274083/
https://www.ncbi.nlm.nih.gov/pubmed/22346598
http://dx.doi.org/10.3390/s110100696
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