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A study on the characteristics of plasma polymer thin film with controlled nitrogen flow rate
Nitrogen-doped thiophene plasma polymer [N-ThioPP] thin films were deposited by radio frequency (13.56 MHz) plasma-enhanced chemical vapor deposition method. Thiophene was used as organic precursor (carbon source) with hydrogen gas as the precursor bubbler gas. Additionally, nitrogen gas [N(2)] was...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Springer
2012
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3285046/ https://www.ncbi.nlm.nih.gov/pubmed/22221905 http://dx.doi.org/10.1186/1556-276X-7-62 |