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Design and validation of a scanning Shack Hartmann aberrometer for measurements of the eye over a wide field of view

Peripheral vision and off-axis aberrations not only play an important role in daily visual tasks but may also influence eye growth and refractive development. Thus it is important to measure off-axis wavefront aberrations of human eyes objectively. To achieve efficient measurement, we incorporated a...

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Detalles Bibliográficos
Autores principales: Wei, Xin, Thibos, Larry
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Optical Society of America 2010
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3369549/
https://www.ncbi.nlm.nih.gov/pubmed/20173936
http://dx.doi.org/10.1364/OE.18.001134
Descripción
Sumario:Peripheral vision and off-axis aberrations not only play an important role in daily visual tasks but may also influence eye growth and refractive development. Thus it is important to measure off-axis wavefront aberrations of human eyes objectively. To achieve efficient measurement, we incorporated a double-pass scanning system with a Shack Hartmann wavefront sensor (SHWS) to develop a scanning Shack Hartmann aberrometer (SSHA). The prototype SSHA successfully measured the off-axis wavefront aberrations over +/− 15 degree visual field within 7 seconds. In two validation experiments with a wide angle model eye, it measured change in defocus aberration accurately (<0.02μm, 4mm pupil) and precisely (<0.03μm, 4mm pupil). A preliminary experiment with a human subject suggests its feasibility in clinical applications.