Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

A rapid and cost-effective lithographic method, polymer blend lithography (PBL), is reported to produce patterned self-assembled monolayers (SAM) on solid substrates featuring two or three different chemical functionalities. For the pattern generation we use the phase separation of two immiscible po...

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Detalles Bibliográficos
Autores principales: Huang, Cheng, Moosmann, Markus, Jin, Jiehong, Heiler, Tobias, Walheim, Stefan, Schimmel, Thomas
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2012
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3458608/
https://www.ncbi.nlm.nih.gov/pubmed/23019558
http://dx.doi.org/10.3762/bjnano.3.71

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3458608/
https://www.ncbi.nlm.nih.gov/pubmed/23019558
http://dx.doi.org/10.3762/bjnano.3.71

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