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Porous silicon/Ni composites of high coercivity due to magnetic field-assisted etching

Ferromagnetic nanostructures have been electrodeposited within the pores of porous silicon templates with average pore diameters between 25 and 60 nm. In this diameter regime, the pore formation in general is accompanied by dendritic growth resulting in rough pore walls, which involves metal deposit...

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Autores principales: Granitzer, Petra, Rumpf, Klemens, Ohta, Toshiyuki, Koshida, Nobuyoshi, Poelt, Peter, Reissner, Michael
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2012
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3460775/
https://www.ncbi.nlm.nih.gov/pubmed/22784792
http://dx.doi.org/10.1186/1556-276X-7-384
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author Granitzer, Petra
Rumpf, Klemens
Ohta, Toshiyuki
Koshida, Nobuyoshi
Poelt, Peter
Reissner, Michael
author_facet Granitzer, Petra
Rumpf, Klemens
Ohta, Toshiyuki
Koshida, Nobuyoshi
Poelt, Peter
Reissner, Michael
author_sort Granitzer, Petra
collection PubMed
description Ferromagnetic nanostructures have been electrodeposited within the pores of porous silicon templates with average pore diameters between 25 and 60 nm. In this diameter regime, the pore formation in general is accompanied by dendritic growth resulting in rough pore walls, which involves metal deposits also offering a branched structure. These side branches influence the magnetic properties of the composite system not only due to modified and peculiar stray fields but also because of a reduced interpore spacing by the approaching of adjacent side pores. To improve the morphology of the porous silicon structures, a magnetic field up to 8 T has been applied during the formation process. The magnetic field etching results in smaller pore diameters with less dendritic side pores. Deposition of a ferromagnetic metal within these templates leads to less branched nanostructures and, thus, to an enhancement of the coercivity of the system and also to a significantly increased magnetic anisotropy. So magnetic field-assisted etching is an appropriate tool to improve the structure of the template concerning the decrease of the dendritic pore growth and to advance the magnetic properties of the composite material.
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spelling pubmed-34607752012-10-02 Porous silicon/Ni composites of high coercivity due to magnetic field-assisted etching Granitzer, Petra Rumpf, Klemens Ohta, Toshiyuki Koshida, Nobuyoshi Poelt, Peter Reissner, Michael Nanoscale Res Lett Nano Express Ferromagnetic nanostructures have been electrodeposited within the pores of porous silicon templates with average pore diameters between 25 and 60 nm. In this diameter regime, the pore formation in general is accompanied by dendritic growth resulting in rough pore walls, which involves metal deposits also offering a branched structure. These side branches influence the magnetic properties of the composite system not only due to modified and peculiar stray fields but also because of a reduced interpore spacing by the approaching of adjacent side pores. To improve the morphology of the porous silicon structures, a magnetic field up to 8 T has been applied during the formation process. The magnetic field etching results in smaller pore diameters with less dendritic side pores. Deposition of a ferromagnetic metal within these templates leads to less branched nanostructures and, thus, to an enhancement of the coercivity of the system and also to a significantly increased magnetic anisotropy. So magnetic field-assisted etching is an appropriate tool to improve the structure of the template concerning the decrease of the dendritic pore growth and to advance the magnetic properties of the composite material. Springer 2012-07-11 /pmc/articles/PMC3460775/ /pubmed/22784792 http://dx.doi.org/10.1186/1556-276X-7-384 Text en Copyright ©2012 Granitzer et al.; licensee Springer. http://creativecommons.org/licenses/by/2.0 This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
spellingShingle Nano Express
Granitzer, Petra
Rumpf, Klemens
Ohta, Toshiyuki
Koshida, Nobuyoshi
Poelt, Peter
Reissner, Michael
Porous silicon/Ni composites of high coercivity due to magnetic field-assisted etching
title Porous silicon/Ni composites of high coercivity due to magnetic field-assisted etching
title_full Porous silicon/Ni composites of high coercivity due to magnetic field-assisted etching
title_fullStr Porous silicon/Ni composites of high coercivity due to magnetic field-assisted etching
title_full_unstemmed Porous silicon/Ni composites of high coercivity due to magnetic field-assisted etching
title_short Porous silicon/Ni composites of high coercivity due to magnetic field-assisted etching
title_sort porous silicon/ni composites of high coercivity due to magnetic field-assisted etching
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3460775/
https://www.ncbi.nlm.nih.gov/pubmed/22784792
http://dx.doi.org/10.1186/1556-276X-7-384
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