Effects of NIR annealing on the characteristics of al-doped ZnO thin films prepared by RF sputtering

Aluminum-doped zinc oxide (AZO) thin films have been deposited on glass substrates by employing radio frequency (RF) sputtering method for transparent conducting oxide applications. For the RF sputtering process, a ZnO:Al(2)O(3) (2 wt.%) target was employed. In this paper, the effects of near infrar...

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Detalles Bibliográficos
Autores principales: Jun, Min-Chul, Koh, Jung-Hyuk
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2012
Materias:
Nano Commentary
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3460783/
https://www.ncbi.nlm.nih.gov/pubmed/22673232
http://dx.doi.org/10.1186/1556-276X-7-294

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3460783/
https://www.ncbi.nlm.nih.gov/pubmed/22673232
http://dx.doi.org/10.1186/1556-276X-7-294

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