Opto-structural studies of well-dispersed silicon nano-crystals grown by atom beam sputtering

Synthesis and characterization of nano-crystalline silicon grown by atom beam sputtering technique are reported. Rapid thermal annealing of the deposited films is carried out in Ar + 5% H(2) atmosphere for 5 min at different temperatures for precipitation of silicon nano-crystals. The samples are ch...

Descripción completa

Detalles Bibliográficos
Autores principales: Saxena, Nupur, Kumar, Pragati, Kabiraj, Debulal, Kanjilal, Dinakar
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2012
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3502530/
https://www.ncbi.nlm.nih.gov/pubmed/23031449
http://dx.doi.org/10.1186/1556-276X-7-547

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3502530/
https://www.ncbi.nlm.nih.gov/pubmed/23031449
http://dx.doi.org/10.1186/1556-276X-7-547

Ejemplares similares