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Characterization of Er in porous Si

The fabrication of porous Si-based Er-doped light-emitting devices is a very promising developing field for all-silicon light emitters. However, while luminescence of Er-doped porous silicon devices has been demonstrated, very little attention has been devoted to the doping process itself. We have u...

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Detalles Bibliográficos
Autores principales: Mula, Guido, Setzu, Susanna, Manunza, Gianluca, Ruffilli, Roberta, Falqui, Andrea
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2012
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3506500/
https://www.ncbi.nlm.nih.gov/pubmed/22776613
http://dx.doi.org/10.1186/1556-276X-7-376
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author Mula, Guido
Setzu, Susanna
Manunza, Gianluca
Ruffilli, Roberta
Falqui, Andrea
author_facet Mula, Guido
Setzu, Susanna
Manunza, Gianluca
Ruffilli, Roberta
Falqui, Andrea
author_sort Mula, Guido
collection PubMed
description The fabrication of porous Si-based Er-doped light-emitting devices is a very promising developing field for all-silicon light emitters. However, while luminescence of Er-doped porous silicon devices has been demonstrated, very little attention has been devoted to the doping process itself. We have undertaken a detailed study of this process, examining the porous silicon matrix from several points of view during and after the doping. In particular, we have found that the Er-doping process shows a threshold level which, as evidenced by the cross correlation of the various techniques used, does depend on the sample thickness and on the doping parameters.
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spelling pubmed-35065002012-11-29 Characterization of Er in porous Si Mula, Guido Setzu, Susanna Manunza, Gianluca Ruffilli, Roberta Falqui, Andrea Nanoscale Res Lett Nano Express The fabrication of porous Si-based Er-doped light-emitting devices is a very promising developing field for all-silicon light emitters. However, while luminescence of Er-doped porous silicon devices has been demonstrated, very little attention has been devoted to the doping process itself. We have undertaken a detailed study of this process, examining the porous silicon matrix from several points of view during and after the doping. In particular, we have found that the Er-doping process shows a threshold level which, as evidenced by the cross correlation of the various techniques used, does depend on the sample thickness and on the doping parameters. Springer 2012-07-09 /pmc/articles/PMC3506500/ /pubmed/22776613 http://dx.doi.org/10.1186/1556-276X-7-376 Text en Copyright ©2012 Mula et al.; licensee Springer. http://creativecommons.org/licenses/by/2.0 This is an Open Access article distributed under the terms of the Creative Commons Attribution License ( http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
spellingShingle Nano Express
Mula, Guido
Setzu, Susanna
Manunza, Gianluca
Ruffilli, Roberta
Falqui, Andrea
Characterization of Er in porous Si
title Characterization of Er in porous Si
title_full Characterization of Er in porous Si
title_fullStr Characterization of Er in porous Si
title_full_unstemmed Characterization of Er in porous Si
title_short Characterization of Er in porous Si
title_sort characterization of er in porous si
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3506500/
https://www.ncbi.nlm.nih.gov/pubmed/22776613
http://dx.doi.org/10.1186/1556-276X-7-376
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