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Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO(2) Resists

Detalles Bibliográficos
Autores principales:	Bahlke, Matthias E, Mendoza, Hiroshi A, Ashall, Daniel T, Yin, Allen S, Baldo, Marc A
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	WILEY-VCH Verlag 2012
Materias:	Communications
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3546373/ https://www.ncbi.nlm.nih.gov/pubmed/22965485 http://dx.doi.org/10.1002/adma.201202446

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