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Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices

Patterning of materials at sub-10 nm dimensions is at the forefront of nanotechnology and employs techniques of various complexity, efficiency, areal scale, and cost. Colloid-based patterning is known to be capable of producing individual sub-10 nm objects. However, ordered, large-area nano-arrays,...

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Detalles Bibliográficos
Autores principales: Iovan, Adrian, Fischer, Marco, Lo Conte, Roberto, Korenivski, Vladislav
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2012
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3554416/
https://www.ncbi.nlm.nih.gov/pubmed/23365801
http://dx.doi.org/10.3762/bjnano.3.98

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