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Pure hydrogen low-temperature plasma exposure of HOPG and graphene: Graphane formation?

Single- and multilayer graphene and highly ordered pyrolytic graphite (HOPG) were exposed to a pure hydrogen low-temperature plasma (LTP). Characterizations include various experimental techniques such as photoelectron spectroscopy, Raman spectroscopy and scanning probe microscopy. Our photoemission...

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Autores principales: Eren, Baran, Hug, Dorothée, Marot, Laurent, Pawlak, Rémy, Kisiel, Marcin, Steiner, Roland, Zumbühl, Dominik M, Meyer, Ernst
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2012
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3556725/
https://www.ncbi.nlm.nih.gov/pubmed/23365799
http://dx.doi.org/10.3762/bjnano.3.96
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author Eren, Baran
Hug, Dorothée
Marot, Laurent
Pawlak, Rémy
Kisiel, Marcin
Steiner, Roland
Zumbühl, Dominik M
Meyer, Ernst
author_facet Eren, Baran
Hug, Dorothée
Marot, Laurent
Pawlak, Rémy
Kisiel, Marcin
Steiner, Roland
Zumbühl, Dominik M
Meyer, Ernst
author_sort Eren, Baran
collection PubMed
description Single- and multilayer graphene and highly ordered pyrolytic graphite (HOPG) were exposed to a pure hydrogen low-temperature plasma (LTP). Characterizations include various experimental techniques such as photoelectron spectroscopy, Raman spectroscopy and scanning probe microscopy. Our photoemission measurement shows that hydrogen LTP exposed HOPG has a diamond-like valence-band structure, which suggests double-sided hydrogenation. With the scanning tunneling microscopy technique, various atomic-scale charge-density patterns were observed, which may be associated with different C–H conformers. Hydrogen-LTP-exposed graphene on SiO(2) has a Raman spectrum in which the D peak to G peak ratio is over 4, associated with hydrogenation on both sides. A very low defect density was observed in the scanning probe microscopy measurements, which enables a reverse transformation to graphene. Hydrogen-LTP-exposed HOPG possesses a high thermal stability, and therefore, this transformation requires annealing at over 1000 °C.
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spelling pubmed-35567252013-01-30 Pure hydrogen low-temperature plasma exposure of HOPG and graphene: Graphane formation? Eren, Baran Hug, Dorothée Marot, Laurent Pawlak, Rémy Kisiel, Marcin Steiner, Roland Zumbühl, Dominik M Meyer, Ernst Beilstein J Nanotechnol Full Research Paper Single- and multilayer graphene and highly ordered pyrolytic graphite (HOPG) were exposed to a pure hydrogen low-temperature plasma (LTP). Characterizations include various experimental techniques such as photoelectron spectroscopy, Raman spectroscopy and scanning probe microscopy. Our photoemission measurement shows that hydrogen LTP exposed HOPG has a diamond-like valence-band structure, which suggests double-sided hydrogenation. With the scanning tunneling microscopy technique, various atomic-scale charge-density patterns were observed, which may be associated with different C–H conformers. Hydrogen-LTP-exposed graphene on SiO(2) has a Raman spectrum in which the D peak to G peak ratio is over 4, associated with hydrogenation on both sides. A very low defect density was observed in the scanning probe microscopy measurements, which enables a reverse transformation to graphene. Hydrogen-LTP-exposed HOPG possesses a high thermal stability, and therefore, this transformation requires annealing at over 1000 °C. Beilstein-Institut 2012-12-13 /pmc/articles/PMC3556725/ /pubmed/23365799 http://dx.doi.org/10.3762/bjnano.3.96 Text en Copyright © 2012, Eren et al. https://creativecommons.org/licenses/by/2.0https://www.beilstein-journals.org/bjnano/termsThis is an Open Access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (https://www.beilstein-journals.org/bjnano/terms)
spellingShingle Full Research Paper
Eren, Baran
Hug, Dorothée
Marot, Laurent
Pawlak, Rémy
Kisiel, Marcin
Steiner, Roland
Zumbühl, Dominik M
Meyer, Ernst
Pure hydrogen low-temperature plasma exposure of HOPG and graphene: Graphane formation?
title Pure hydrogen low-temperature plasma exposure of HOPG and graphene: Graphane formation?
title_full Pure hydrogen low-temperature plasma exposure of HOPG and graphene: Graphane formation?
title_fullStr Pure hydrogen low-temperature plasma exposure of HOPG and graphene: Graphane formation?
title_full_unstemmed Pure hydrogen low-temperature plasma exposure of HOPG and graphene: Graphane formation?
title_short Pure hydrogen low-temperature plasma exposure of HOPG and graphene: Graphane formation?
title_sort pure hydrogen low-temperature plasma exposure of hopg and graphene: graphane formation?
topic Full Research Paper
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3556725/
https://www.ncbi.nlm.nih.gov/pubmed/23365799
http://dx.doi.org/10.3762/bjnano.3.96
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