Cargando…
Mo/Si multilayer-coated amplitude-division beam splitters for XUV radiation sources
Amplitude-division beam splitters for XUV radiation sources have been developed and extensively characterized. Mo/Si multilayer coatings were deposited on 50 nm-thick SiN membranes. By changing the multilayer structure (periodicity, number of bilayers, etc.) the intensity of the reflected and transm...
Autores principales: | Sobierajski, Ryszard, Loch, Rolf Antonie, van de Kruijs, Robbert W. E., Louis, Eric, von Blanckenhagen, Gisela, Gullikson, Eric M., Siewert, Frank, Wawro, Andrzej, Bijkerk, Fred |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
International Union of Crystallography
2013
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3573871/ https://www.ncbi.nlm.nih.gov/pubmed/23412481 http://dx.doi.org/10.1107/S0909049512049990 |
Ejemplares similares
-
Α 10-gigawatt attosecond source for non-linear XUV optics and XUV-pump-XUV-probe studies
por: Makos, I., et al.
Publicado: (2020) -
Bifunctional catalytic effect of Mo(2)C/oxide interface on multi-layer graphene growth
por: Kizir, Seda, et al.
Publicado: (2021) -
Diffraction gratings metrology and ray-tracing results for an XUV Raman spectrometer at FLASH
por: Dziarzhytski, Siarhei, et al.
Publicado: (2018) -
XUV laser action in plasmas
por: Key, M H
Publicado: (1990) -
The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II
por: Schäfers, F., et al.
Publicado: (2016)