Cargando…
Structural and electrical characteristics of high-κ Er(2)O(3) and Er(2)TiO(5) gate dielectrics for a-IGZO thin-film transistors
In this letter, we investigated the structural and electrical characteristics of high-κ Er(2)O(3) and Er(2)TiO(5) gate dielectrics on the amorphous indium-gallium-zinc-oxide (a-IGZO) thin-film transistor (TFT) devices. Compared with the Er(2)O(3) dielectric, the a-IGZO TFT device incorporating an Er...
Autores principales: | , , , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer
2013
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3584805/ https://www.ncbi.nlm.nih.gov/pubmed/23294730 http://dx.doi.org/10.1186/1556-276X-8-18 |
_version_ | 1782261062877315072 |
---|---|
author | Chen, Fa-Hsyang Her, Jim-Long Shao, Yu-Hsuan Matsuda, Yasuhiro H Pan, Tung-Ming |
author_facet | Chen, Fa-Hsyang Her, Jim-Long Shao, Yu-Hsuan Matsuda, Yasuhiro H Pan, Tung-Ming |
author_sort | Chen, Fa-Hsyang |
collection | PubMed |
description | In this letter, we investigated the structural and electrical characteristics of high-κ Er(2)O(3) and Er(2)TiO(5) gate dielectrics on the amorphous indium-gallium-zinc-oxide (a-IGZO) thin-film transistor (TFT) devices. Compared with the Er(2)O(3) dielectric, the a-IGZO TFT device incorporating an Er(2)TiO(5) gate dielectric exhibited a low threshold voltage of 0.39 V, a high field-effect mobility of 8.8 cm(2)/Vs, a small subthreshold swing of 143 mV/decade, and a high I(on)/I(off) current ratio of 4.23 × 10(7), presumably because of the reduction in the oxygen vacancies and the formation of the smooth surface roughness as a result of the incorporation of Ti into the Er(2)TiO(5) film. Furthermore, the reliability of voltage stress can be improved using an Er(2)TiO(5) gate dielectric. |
format | Online Article Text |
id | pubmed-3584805 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2013 |
publisher | Springer |
record_format | MEDLINE/PubMed |
spelling | pubmed-35848052013-03-05 Structural and electrical characteristics of high-κ Er(2)O(3) and Er(2)TiO(5) gate dielectrics for a-IGZO thin-film transistors Chen, Fa-Hsyang Her, Jim-Long Shao, Yu-Hsuan Matsuda, Yasuhiro H Pan, Tung-Ming Nanoscale Res Lett Nano Express In this letter, we investigated the structural and electrical characteristics of high-κ Er(2)O(3) and Er(2)TiO(5) gate dielectrics on the amorphous indium-gallium-zinc-oxide (a-IGZO) thin-film transistor (TFT) devices. Compared with the Er(2)O(3) dielectric, the a-IGZO TFT device incorporating an Er(2)TiO(5) gate dielectric exhibited a low threshold voltage of 0.39 V, a high field-effect mobility of 8.8 cm(2)/Vs, a small subthreshold swing of 143 mV/decade, and a high I(on)/I(off) current ratio of 4.23 × 10(7), presumably because of the reduction in the oxygen vacancies and the formation of the smooth surface roughness as a result of the incorporation of Ti into the Er(2)TiO(5) film. Furthermore, the reliability of voltage stress can be improved using an Er(2)TiO(5) gate dielectric. Springer 2013-01-08 /pmc/articles/PMC3584805/ /pubmed/23294730 http://dx.doi.org/10.1186/1556-276X-8-18 Text en Copyright ©2013 Chen et al; licensee Springer. http://creativecommons.org/licenses/by/2.0 This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. |
spellingShingle | Nano Express Chen, Fa-Hsyang Her, Jim-Long Shao, Yu-Hsuan Matsuda, Yasuhiro H Pan, Tung-Ming Structural and electrical characteristics of high-κ Er(2)O(3) and Er(2)TiO(5) gate dielectrics for a-IGZO thin-film transistors |
title | Structural and electrical characteristics of high-κ Er(2)O(3) and Er(2)TiO(5) gate dielectrics for a-IGZO thin-film transistors |
title_full | Structural and electrical characteristics of high-κ Er(2)O(3) and Er(2)TiO(5) gate dielectrics for a-IGZO thin-film transistors |
title_fullStr | Structural and electrical characteristics of high-κ Er(2)O(3) and Er(2)TiO(5) gate dielectrics for a-IGZO thin-film transistors |
title_full_unstemmed | Structural and electrical characteristics of high-κ Er(2)O(3) and Er(2)TiO(5) gate dielectrics for a-IGZO thin-film transistors |
title_short | Structural and electrical characteristics of high-κ Er(2)O(3) and Er(2)TiO(5) gate dielectrics for a-IGZO thin-film transistors |
title_sort | structural and electrical characteristics of high-κ er(2)o(3) and er(2)tio(5) gate dielectrics for a-igzo thin-film transistors |
topic | Nano Express |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3584805/ https://www.ncbi.nlm.nih.gov/pubmed/23294730 http://dx.doi.org/10.1186/1556-276X-8-18 |
work_keys_str_mv | AT chenfahsyang structuralandelectricalcharacteristicsofhighker2o3ander2tio5gatedielectricsforaigzothinfilmtransistors AT herjimlong structuralandelectricalcharacteristicsofhighker2o3ander2tio5gatedielectricsforaigzothinfilmtransistors AT shaoyuhsuan structuralandelectricalcharacteristicsofhighker2o3ander2tio5gatedielectricsforaigzothinfilmtransistors AT matsudayasuhiroh structuralandelectricalcharacteristicsofhighker2o3ander2tio5gatedielectricsforaigzothinfilmtransistors AT pantungming structuralandelectricalcharacteristicsofhighker2o3ander2tio5gatedielectricsforaigzothinfilmtransistors |