Cargando…
Polymerization Inhibition by Triplet State Absorption for Nanoscale Lithography
Autores principales: | Harke, Benjamin, Dallari, William, Grancini, Giulia, Fazzi, Daniele, Brandi, Fernando, Petrozza, Annamaria, Diaspro, Alberto |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
WILEY-VCH Verlag
2013
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3594812/ https://www.ncbi.nlm.nih.gov/pubmed/23303534 http://dx.doi.org/10.1002/adma.201204141 |
Ejemplares similares
-
Photopolymerization Inhibition Dynamics for Sub-Diffraction Direct Laser Writing Lithography
por: Harke, Benjamin, et al.
Publicado: (2012) -
Ultrafast Energy Transfer in Ultrathin Organic Donor/Acceptor Blend
por: Kandada, Ajay Ram Srimath, et al.
Publicado: (2013) -
Nanoscale Bilayer Mechanical Lithography Using Water
as Developer
por: Shu, Yu, et al.
Publicado: (2021) -
Nanoscale 2.5-dimensional surface patterning with plasmonic lithography
por: Jung, Howon, et al.
Publicado: (2017) -
Control of Nanoscale Heat Generation with Lithography-Free
Metasurface Absorbers
por: Stewart, Jon W., et al.
Publicado: (2022)