Antireflective silicon nanostructures with hydrophobicity by metal-assisted chemical etching for solar cell applications

We present broadband antireflective silicon (Si) nanostructures with hydrophobicity using a spin-coated Ag ink and by subsequent metal-assisted chemical etching (MaCE). Improved understanding of MaCE, by conducting parametric studies on optical properties, reveals a design guideline to achieve consi...

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Detalles Bibliográficos
Autores principales: Yeo, ChanIl, Kim, Joon Beom, Song, Young Min, Lee, Yong Tak
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer 2013
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3626851/
https://www.ncbi.nlm.nih.gov/pubmed/23566597
http://dx.doi.org/10.1186/1556-276X-8-159

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3626851/
https://www.ncbi.nlm.nih.gov/pubmed/23566597
http://dx.doi.org/10.1186/1556-276X-8-159

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